Patent Assignment Details
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| Reel/Frame: | 017524/0455 | |
| Pages: | 3 |
| | Recorded: | 02/03/2006 | | |
| Attorney Dkt #: | 02887.0365 |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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11266241
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Filing Dt:
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11/04/2005
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Publication #:
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Pub Dt:
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10/12/2006
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Title:
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Method of forming self-aligned fully silicided gate and silicided source and drain
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Assignee
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| 1-1, SHIBAURA 1-CHOME |
| MINATO-KU |
| TOKYO, JAPAN |
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Correspondence name and address
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ERNEST F. CHAPMAN
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FINNEGAN, HEDERSON, FARABOW ET AL.
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901 NEW YORK AVENUE, NW
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WASHINGTON, D.C. 20001-4413
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