Patent Assignment Details
NOTE:Results display only for issued patents and published applications.
For pending or abandoned applications please consult USPTO staff.
|
| Reel/Frame: | 017690/0622 | |
| Pages: | 4 |
| | Recorded: | 08/23/2005 | | |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
|
|
Total properties:
1
|
|
|
|
Patent #:
|
|
Issue Dt:
|
09/04/2007
|
Application #:
|
10546529
|
Filing Dt:
|
08/23/2005
|
|
Publication #:
|
|
Pub Dt:
|
07/13/2006
| | | | |
|
Title:
|
RESIST COMPOSITION FOR LIQUID IMMERSION LITHOGRAPHY PROCESS AND METHOD FOR FORMING RESIST PATTERN USING THE RESIST COMPOSITION
|
|
|
Assignee
|
|
|
|
|
| 150, NAKAMARUKO, NAKAHARA-KU, KAWASAKI-SHI |
| KANAGAWA, JAPAN 211-0012 |
|
|
Correspondence name and address
|
| |
WENDEROTH, LIND & PONACK, L.L.P.
|
| |
ATTN: MATTHEW M. JACOB, ESQ.
|
| |
2033 K STREET, N.W., SUITE 800
|
| |
WASHINGTON, DC 20006-1021
|
Search Results as of:
05/01/2024 08:32 PM
If you have any comments or questions concerning the data displayed,
contact
PRD / Assignments at 571-272-3350. v.2.6
Web interface last modified:
August 25, 2017 v.2.6
|
