Patent Assignment Details
NOTE:Results display only for issued patents and published applications.
For pending or abandoned applications please consult USPTO staff.
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| Reel/Frame: | 018120/0348 | |
| Pages: | 3 |
| | Recorded: | 08/15/2006 | | |
| Attorney Dkt #: | 047297-0124 |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
6
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Patent #:
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Issue Dt:
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05/09/2000
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Application #:
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08991407
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Filing Dt:
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12/16/1997
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Title:
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VAPOR DEPOSITION APPARATUS AND METHOD FOR FORMING THIN FILM
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Patent #:
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Issue Dt:
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10/17/2000
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Application #:
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08991409
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Filing Dt:
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12/16/1997
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Title:
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VAPOR DEPOSITION APPARATUS AND VAPOR DEPOSITION METHOD
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Patent #:
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Issue Dt:
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09/05/2000
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Application #:
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09137298
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Filing Dt:
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08/20/1998
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Title:
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HIGH-SPEED ROTATIONAL VAPOR DEPOSITION APPARATUS AND HIGH-SPEED ROTATIONAL VAPOR DEPOSITION THIN FILM FORMING METHOD
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Patent #:
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Issue Dt:
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10/08/2002
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Application #:
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09729669
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Filing Dt:
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12/05/2000
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Publication #:
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Pub Dt:
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09/13/2001
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Title:
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METHOD AND APPARATUS FOR CONTROLLING RISE AND FALL OF TEMPERATURE IN SEMICONDUCTOR SUBSTRATES
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Patent #:
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Issue Dt:
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11/26/2002
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Application #:
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09855654
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Filing Dt:
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05/16/2001
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Publication #:
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Pub Dt:
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12/20/2001
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Title:
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APPARATUS FOR REDUCED-PRESSURE EPITAXIAL GROWTH AND METHOD OF CONTROLLING THE APPARATUS
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Patent #:
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Issue Dt:
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03/25/2003
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Application #:
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09921893
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Filing Dt:
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08/06/2001
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Publication #:
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Pub Dt:
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04/18/2002
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Title:
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METHOD OF CHEMICALLY GROWING A THIN FILM IN A GAS PHASE ON A SILICON SEMICONDUCTOR SUBSTRATE
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Assignee
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| 2068-3, OOKA, NUMAZU-SHI |
| SHIZUOKA-KEN, JAPAN |
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Correspondence name and address
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RICHARD L. SCHWAAB
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FOLEY & LARDNER LLP
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WASHINGTON HARBOUR
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3000 K STREET NW, SUITE 500
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WASHINGTON, D.C. 20007-5143
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