Patent Assignment Details
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| Reel/Frame: | 018191/0208 | |
| Pages: | 5 |
| | Recorded: | 08/15/2006 | | |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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10589382
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Filing Dt:
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08/15/2006
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Publication #:
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Pub Dt:
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08/16/2007
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Title:
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Photoresist composition and method of forming resist pattern
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Assignee
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| 150, NAKAMARUKO |
| NAKAHARA-KU, KAWASAKI-SHI |
| KANAGAWA, JAPAN 211-0012 |
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Correspondence name and address
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DANIEL A. SCOLA, JR.
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HOFFMANN & BARON, LLP
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6900 JERICHO TURNPIKE
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SYOSSET, NY 11791
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