Total properties:
15
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Patent #:
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Issue Dt:
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07/10/2007
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Application #:
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10362044
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Filing Dt:
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02/19/2003
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Publication #:
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Pub Dt:
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08/21/2003
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Title:
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HAFNIUM SILICIDE TARGET FOR GATE OXIDE FILM FORMATION AND ITS PRODUCTION METHOD
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Patent #:
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Issue Dt:
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10/14/2008
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Application #:
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10471112
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Filing Dt:
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09/05/2003
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Publication #:
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Pub Dt:
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04/15/2004
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Title:
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METHOD FOR PRODUCING HIGH PURITY NICKLE, HIGH PURITY NICKLE, SPUTTERING TARGET COMPRISING THE HIGH PURITY NICKEL, AND THIN FILM FORMED BY USING SAID SPATTERING TARGET
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Patent #:
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Issue Dt:
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06/12/2007
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Application #:
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10474451
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Filing Dt:
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10/07/2003
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Publication #:
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Pub Dt:
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06/03/2004
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Title:
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MANGANESE ALLOY SPUTTERING TARGET AND METHOD FOR PRODUCING THE SAME
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Patent #:
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Issue Dt:
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05/20/2008
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Application #:
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10478750
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Filing Dt:
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11/24/2003
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Publication #:
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Pub Dt:
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08/05/2004
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Title:
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ELECTROLYTIC COPPER PLATING METHOD, PHOSPHORUS-CONTAINING ANODE FOR ELECTROLYTIC COPPER PLATING, AND SEMICONDUCTOR WAFER PLATED USING THEM AND HAVING FEW PARTICLES ADHERING TO IT
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Patent #:
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NONE
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Issue Dt:
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Application #:
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10479687
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Filing Dt:
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12/04/2003
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Publication #:
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Pub Dt:
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07/29/2004
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Title:
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Airu spattering target and method for preparation thereof
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Patent #:
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Issue Dt:
|
04/14/2009
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Application #:
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10480319
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Filing Dt:
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12/10/2003
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Publication #:
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Pub Dt:
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09/02/2004
| | | | |
Title:
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HAFNIUM SILICIDE TARGET FOR FORMING GATE OXIDE FILM AND METHOD FOR PREPARATION THEREOF
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Patent #:
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Issue Dt:
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01/19/2010
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Application #:
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10486078
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Filing Dt:
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02/06/2004
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Publication #:
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Pub Dt:
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10/14/2004
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Title:
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COPPER ELECTROPLATING METHOD, PURE COPPER ANODE FOR COPPER ELECTROPLATING, AND SEMICONDUCTOR WAFER PLATED THEREBY WITH LITTLE PARTICLE ADHESION
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Patent #:
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NONE
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Issue Dt:
|
|
Application #:
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10492310
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Filing Dt:
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04/12/2004
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Publication #:
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Pub Dt:
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12/09/2004
| | | | |
Title:
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Sputtering target and production method therefor
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Patent #:
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Issue Dt:
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03/25/2008
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Application #:
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10498146
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Filing Dt:
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06/08/2004
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Publication #:
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Pub Dt:
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12/30/2004
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Title:
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METHOD FOR CONNECTING MAGNETIC SUBSTANCE TARGET TO BACKING PLATE, AND MAGNETIC SUBSTANCE TARGET
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Patent #:
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Issue Dt:
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06/22/2010
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Application #:
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10498147
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Filing Dt:
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06/08/2004
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Publication #:
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Pub Dt:
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12/23/2004
| | | | |
Title:
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TARGET OF HIGH-PURITY NICKEL OR NICKEL ALLOY AND ITS PRODUCING METHOD
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Patent #:
|
|
Issue Dt:
|
02/20/2018
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Application #:
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10501117
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Filing Dt:
|
01/14/2005
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Publication #:
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Pub Dt:
|
06/09/2005
| | | | |
Title:
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Copper alloy sputtering target and method for manufacturing the target
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|
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Patent #:
|
|
Issue Dt:
|
10/09/2007
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Application #:
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10503296
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Filing Dt:
|
08/02/2004
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Publication #:
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Pub Dt:
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04/21/2005
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Title:
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SPUTTERING TARGET CONTAINING ZINC SULFIDE AS MAJOR COMPONENT, OPTICAL RECORDING MEDIUM ON WHICH PHASE CHANGE OPTICAL DISK PROTECTIVE FILM CONTAINING ZINC SULFIDE AS MAJOR COMPONENT IS FORMED BY USING THE TARGET, AND METHOD FOR MANUFACTURING THE SPUTTERING TARGET
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Patent #:
|
|
Issue Dt:
|
01/02/2007
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Application #:
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10504739
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Filing Dt:
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08/16/2004
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Publication #:
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Pub Dt:
|
06/02/2005
| | | | |
Title:
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SPUTTERING TARGET FOR PHASE-CHANGE MEMORY, FILM FOR PHASE CHANGE MEMORY FORMED BY USING THE TARGET, AND METHOD FOR PRODUCING THE TARGET
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Patent #:
|
|
Issue Dt:
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11/17/2009
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Application #:
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11332045
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Filing Dt:
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01/13/2006
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Publication #:
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Pub Dt:
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06/29/2006
| | | | |
Title:
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TARGET OF HIGH-PURITY NICKEL OR NICKEL ALLOY AND ITS PRODUCING METHOD
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|
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Patent #:
|
|
Issue Dt:
|
02/03/2009
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Application #:
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11533945
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Filing Dt:
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09/21/2006
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Publication #:
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Pub Dt:
|
03/22/2007
| | | | |
Title:
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SPUTTERING TARGET FOR PHASE-CHANGE MEMORY, FILM FOR PHASE CHANGE MEMORY FORMED BY USING THE TARGET, AND METHOD FOR PRODUCING THE TARGET
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