Patent Assignment Details
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| Reel/Frame: | 018698/0655 | |
| Pages: | 2 |
| | Recorded: | 12/11/2006 | | |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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03/25/2014
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Application #:
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11636482
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Filing Dt:
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12/11/2006
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Publication #:
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Pub Dt:
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06/14/2007
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Title:
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Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition
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Assignee
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| 26-30, NISHIAZABU 2-CHOME |
| MINATO-KU |
| TOKYO, JAPAN |
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Correspondence name and address
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SUGHRUE MION, PLLC
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2100 PENNSYLVANIA AVENUE, N.W.
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SUITE 800
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WASHINGTON, DC 20037
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