Patent Assignment Details
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For pending or abandoned applications please consult USPTO staff.
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| Reel/Frame: | 018741/0825 | |
| Pages: | 4 |
| | Recorded: | 01/08/2007 | | |
| Attorney Dkt #: | 21768-002US1 |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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07/20/2010
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Application #:
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11578814
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Filing Dt:
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10/19/2006
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Publication #:
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Pub Dt:
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11/01/2007
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Title:
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SILICON SEMICONDUCTOR SUBSTRATE HEAT-TREATMENT METHOD AND SILICON SEMICONDUCTOR SUBSTRATE TREATED BY THE METHOD
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Assignee
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| 25-1, SHINOMIYA 3-CHOME, HIRATSUKA-SHI |
| KANAGAWA 254-0014, JAPAN |
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Correspondence name and address
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J. ROBIN ROHLICEK, J.D., PH.D.
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FISH & RICHARDSON P.C.
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225 FRANKLIN STREET
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BOSTON, MA 02110
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