Patent Assignment Details
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| Reel/Frame: | 018980/0719 | |
| Pages: | 5 |
| | Recorded: | 03/08/2007 | | |
| Attorney Dkt #: | 05-1104-A |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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11643235
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Filing Dt:
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12/21/2006
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Publication #:
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Pub Dt:
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02/11/2010
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Title:
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Method for forming silicon germanium layers at low temperatures, layers formed therewith and structures comprising such layers
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Assignees
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| KAPELDREEF 75 |
| LEUVEN, BELGIUM 3001 |
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| 113 KASR EL AINI STREET |
| CAIRO, EGYPT 11511 |
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Correspondence name and address
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MCDONNELL BOEHNEN HULBERT & BERGHOFF LLP
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300 SOUTH WACKER DRIVE
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JOHN G. TOLOMEI
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CHICAGO, IL 60606
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