Patent Assignment Details
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| Reel/Frame: | 018994/0024 | |
| Pages: | 2 |
| | Recorded: | 02/28/2007 | | |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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11661426
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Filing Dt:
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02/28/2007
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Publication #:
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Pub Dt:
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08/14/2008
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Title:
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Rinsing Liquid for Lithography and Method for Resist Pattern Formation
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Assignee
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| 150, NAKAMARUKO, NAKAHARA-KU |
| KAWASAKI-SHI |
| KANAGAWA, JAPAN |
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Correspondence name and address
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WENDEROTH, LIND & PONACK, L.L.P.
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ATTN: MATTHEW M. JACOB, ESQ.
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2033 K STREET, N.W., SUITE
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WASHINGTON, DC 20006-1021
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