Patent Assignment Details
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| Reel/Frame: | 019385/0772 | |
| Pages: | 7 |
| | Recorded: | 06/05/2007 | | |
| Attorney Dkt #: | 264197US0PCT |
| Conveyance: | CHANGE OF NAME (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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01/08/2008
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Application #:
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10519837
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Filing Dt:
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07/05/2005
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Publication #:
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Pub Dt:
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11/10/2005
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Title:
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HIGH-RESISTANCE SILICON WAFER AND PROCESS FOR PRODUCING THE SAME
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Assignee
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| 2-1, SHIBAURA 1-CHOME, MINATO-KU |
| TOKYO 105-8634, JAPAN |
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Correspondence name and address
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OBLON, SPIVAK, MCCLELLAND, MAIER & NEUST
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1940 DUKE STREET
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ALEXANDRIA, VA 22314
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