Patent Assignment Details
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| Reel/Frame: | 019397/0732 | |
| Pages: | 3 |
| | Recorded: | 05/29/2007 | | |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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09/14/2010
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Application #:
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11791723
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Filing Dt:
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05/29/2007
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Publication #:
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Pub Dt:
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04/24/2008
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Title:
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CLEANING LIQUID FOR LITHOGRAPHY AND METHOD FOR RESIST PATTERN FORMATION
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Assignee
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| 150, NAKAMARUKO, NAKAHARA-KU, KAWASAKI-SHI |
| KANAGAWA, JAPAN |
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Correspondence name and address
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WENDEROTH, LIND & PONACK, L.L.P.
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ATTN: MATTHEW M. JACOB, ESQ.
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2033 K STREET, N.W., SUITE 800
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WASHINGTON, DC 20006-1021
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