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Total properties:
74
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Patent #:
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Issue Dt:
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03/25/1986
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06612355
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05/21/1984
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Title:
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04/19/1988
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06747895
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06/24/1985
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Title:
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VESSEL AND SYSTEM FOR TREATING WAFERS WITH FLUIDS
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Issue Dt:
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10/18/1988
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06765294
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08/13/1985
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Title:
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01/03/1989
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06805203
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12/04/1985
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04/26/1988
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06922882
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10/24/1986
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Patent #:
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05/30/1989
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07071663
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Filing Dt:
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07/09/1987
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Patent #:
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08/29/1989
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07222526
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07/21/1988
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02/13/1990
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07283465
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12/12/1988
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Title:
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Patent #:
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08/22/1989
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07328806
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03/24/1989
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07/13/1993
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07837221
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02/18/1992
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01/24/1995
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07904647
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06/26/1992
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10/29/1996
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08367358
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01/13/1995
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03/16/1999
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06/07/1996
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04/28/1998
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06/07/1996
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10/17/2000
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07/19/1996
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06/05/2001
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12/06/1996
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01/02/2001
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04/15/1997
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09/21/1999
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05/23/1997
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05/11/1999
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07/03/1997
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03/07/2000
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06/24/1997
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03/28/2000
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08/27/1997
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03/09/1999
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11/12/1997
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12/08/1998
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10/31/1997
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10/24/2000
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02/18/1998
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02/25/2003
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07/07/1998
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07/19/2001
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10/26/1999
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06/12/1998
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09/11/2001
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06/25/1998
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09145192
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09/01/1998
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12/06/2001
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08/07/2001
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03/22/1999
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11/14/2000
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10/23/1998
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08/07/2001
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03/19/1999
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12/17/2002
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12/10/1998
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01/09/2001
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01/08/1999
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12/11/2001
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11/28/2000
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01/21/1999
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07/17/2001
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02/25/1999
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06/12/2001
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03/05/1999
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07/24/2001
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03/05/1999
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10/31/2000
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04/30/2002
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03/30/1999
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11/22/2001
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04/30/2002
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07/10/2001
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04/23/1999
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04/23/1999
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06/12/2001
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11/18/2003
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12/03/1999
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12/26/2000
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09/14/1999
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03/21/2002
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05/04/2004
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07/31/2001
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07/17/2002
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08/22/2002
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|
Publication #:
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Pub Dt:
|
05/29/2003
| | | | |
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Title:
|
DEVICE AND METHOD FOR THE TREATMENT OF SEMICONDUCTOR WAFERS
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|
|
|
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Patent #:
|
NONE
|
Issue Dt:
|
|
Application #:
|
10501256
|
Filing Dt:
|
07/08/2004
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|
Publication #:
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|
Pub Dt:
|
08/18/2005
| | | | |
|
Title:
|
Apparatus and method for treating disc-shaped substrates
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|
|
|
|
Patent #:
|
NONE
|
Issue Dt:
|
|
Application #:
|
10537996
|
Filing Dt:
|
06/03/2005
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|
Publication #:
|
|
Pub Dt:
|
07/06/2006
| | | | |
|
Title:
|
Method for drying substrates
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|
|
|
|
Patent #:
|
NONE
|
Issue Dt:
|
|
Application #:
|
10620895
|
Filing Dt:
|
07/16/2003
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|
Publication #:
|
|
Pub Dt:
|
03/18/2004
| | | | |
|
Title:
|
Compositions and method for removing photoresist and/or resist residue at pressures ranging from ambient to supercritical
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|
