Patent Assignment Details
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| Reel/Frame: | 020349/0750 | |
| Pages: | 7 |
| | Recorded: | 01/10/2008 | | |
| Attorney Dkt #: | 1608-15 PCT/US(0022) |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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11995291
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Filing Dt:
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01/10/2008
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Publication #:
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Pub Dt:
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05/20/2010
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Title:
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MATERIAL FOR PROTECTIVE FILM FORMATION, AND METHOD FOR PHOTORESIST PATTERN FORMATION USING THE SAME
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Assignee
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| 150, NAKAMARUKO, NAKAHARA-KU, KAWASAKI-SHI |
| KANAGAWA, JAPAN 211-0012 |
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Correspondence name and address
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HOFFMANN & BARON, LLP
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6900 JERICHO TURNPIKE
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SYOSSET, NY 11791
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