Patent Assignment Details
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Reel/Frame: | 020491/0076 | |
| Pages: | 5 |
| | Recorded: | 02/11/2008 | | |
Attorney Dkt #: | 026390-00051 |
Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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11884358
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Filing Dt:
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02/11/2008
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Publication #:
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Pub Dt:
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08/20/2009
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Title:
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Method for Preparing Modified Porous Silica Films, Modified Porous Silica Films Prepared According to This Method and Semiconductor Devices Fabricated Using the Modified Porous Silica Films
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Assignees
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2500 HAGISONO, CHIGASAKI |
KANAGAWA, JAPAN 253-8543 |
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5-2, HIGASHI-SHIMBASHI 1-CHOME, MINATO-KU, |
TOKYO, JAPAN 105-7117 |
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3-6 AKASAKA 5-CHOME MINATO-KU |
TOKYO, JAPAN 107-8481 |
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Correspondence name and address
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ARENT FOX LLP
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1050 CONNECTICUT AVENUE, N.W.
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SUITE 400
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WASHINGTON, DC 20036
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