Patent Assignment Details
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| Reel/Frame: | 020491/0517 | |
| Pages: | 2 |
| | Recorded: | 02/11/2008 | | |
| Attorney Dkt #: | 07881/LH |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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12004679
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Filing Dt:
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12/21/2007
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Publication #:
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Pub Dt:
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09/18/2008
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Title:
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Plasma CVD apparatus and film deposition method
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Assignees
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| 3992-2, NUNOSHIDA, KOCHI-SHI |
| KOCHI, JAPAN 781-5101 |
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| 6-2, HON-MACHI 1-CHOME, SHIBUYA-KU |
| TOKYO, JAPAN 151-8543 |
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Correspondence name and address
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FRISHAUF, HOLTZ, GOODMAN & CHICK, PC
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220 FIFTH AVENUE
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16TH FLOOR
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NEW YORK, NY 10001-7708
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