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Patent Assignment Details
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Reel/Frame:020592/0358   Pages: 7
Recorded: 03/03/2008
Conveyance: CORRECTION OF INVENTORSHIP OF PREVIOUSLY RECORDED ASSIGNMENT REEL 020523 FRAME 0711,RECORDED 2/15/08
Total properties: 1
1
Patent #:
NONE
Issue Dt:
Application #:
11898990
Filing Dt:
09/18/2007
Publication #:
Pub Dt:
06/12/2008
Title:
Two step cleaning process to remove resist, etch residue, and copper oxide from substrates having copper and low-K dielectric material
Assignor
1
Exec Dt:
03/19/2005
Assignee
1
2520 BARRINGTON COURT
HAYWARD, CALIFORNIA 94545-1163
Correspondence name and address
MORGAN, LEWIS & BOCKIUS LLP
1111 PENNSYLVANIA AVENUE, N.W.
WASHINGTON, D.C. 20004

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