Patent Assignment Details
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| Reel/Frame: | 021320/0711 | |
| Pages: | 3 |
| | Recorded: | 07/30/2008 | | |
| Attorney Dkt #: | SHIGA7.145APC |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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06/28/2011
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Application #:
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12160957
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Filing Dt:
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07/15/2008
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Publication #:
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Pub Dt:
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08/05/2010
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Title:
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POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND METHOD OF FORMING RESIST PATTERN
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Assignee
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| 150, NAKAMARUKO, NAKAHARA-KU, KANAGAWA-KEN |
| KAWASAKI-SHI, JAPAN |
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Correspondence name and address
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KNOBBE, MARTENS, OLSON & BEAR, LLP
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2040 MAIN STREET, 14TH FLOOR
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IRVINE, CA 92614
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