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Patent Assignment Details
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Reel/Frame:021339/0832   Pages: 4
Recorded: 08/07/2008
Attorney Dkt #:930130-2000
Conveyance: ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Total properties: 6
1
Patent #:
Issue Dt:
11/07/2000
Application #:
09274258
Filing Dt:
03/22/1999
Title:
ALUMINUM COMPLEX DERIVATIVES FOR CHEMICAL VACUUM EVAPORATION AND THE METHOD OF PRODUCING THE SAME
2
Patent #:
Issue Dt:
09/19/2000
Application #:
09283317
Filing Dt:
03/31/1999
Title:
COMPOUND FOR THE ALUMINUM FILM FROM CHEMICAL VAPOR DEPOSITIONS AND THE METHOD OF SYNTHESIS
3
Patent #:
Issue Dt:
04/30/2002
Application #:
09595109
Filing Dt:
06/16/2000
Title:
COMPOUND FOR THE ALUMINUM FILM FROM CHEMICAL VAPOR DEPOSITION AND THE METHOD OF SYNTHESIS
4
Patent #:
Issue Dt:
06/04/2002
Application #:
09596115
Filing Dt:
06/16/2000
Title:
ALUMINUM COMPLEX DERIVATIVES FOR CHEMICAL VACUUM EVAPORATION AND THE METHOD OF PRODUCING THE SAME
5
Patent #:
NONE
Issue Dt:
Application #:
11078610
Filing Dt:
03/11/2005
Publication #:
Pub Dt:
09/15/2005
Title:
Precursor compounds for deposition of ceramic and metal films and preparation methods thereof
6
Patent #:
Issue Dt:
07/26/2011
Application #:
11600628
Filing Dt:
11/16/2006
Publication #:
Pub Dt:
04/22/2010
Title:
METHOD FOR THIN FILM VAPOR DEPOSITION OF A DIALKYL AMIDO DIHYDROALUMINUM COMPOUND
Assignor
1
Exec Dt:
07/07/2008
Assignee
1
576-2 CHILGWE-DONG, PYEONGTAEK-SI
GYEONGGI-DO, KOREA, REPUBLIC OF 459-050
Correspondence name and address
FROMMER LAWRENCE & HAUG LLP
745 FIFTH AVENUE
10TH FLOOR
NEW YORK, NY 10151

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