Patent Assignment Details
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| Reel/Frame: | 021492/0492 | |
| Pages: | 12 |
| | Recorded: | 09/05/2008 | | |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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12202847
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Filing Dt:
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09/02/2008
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Publication #:
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Pub Dt:
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01/01/2009
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Title:
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Manufacturing Method of High Purity Nickel, High Purity Nickel, Sputtering Target formed from said High Purity Nickel, and Thin Film formed with said Sputtering Target
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Assignee
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| 10-1, TORANOMON 2-CHOME |
| MINATO-KU TOKYO, JAPAN 105-0001 |
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Correspondence name and address
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HOWSON AND HOWSON
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SUITE 220, 501 OFFICE CENTER DRIVE
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FT. WASHINGTON, PENNSYLVANIA 19034
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