Patent Assignment Details
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Reel/Frame: | 022815/0028 | |
| Pages: | 4 |
| | Recorded: | 06/11/2009 | | |
Attorney Dkt #: | 56436.0200 |
Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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06/12/2012
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Application #:
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12416809
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Filing Dt:
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04/01/2009
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Publication #:
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Pub Dt:
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10/07/2010
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Title:
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METHOD OF DEPOSITING SILICON OXIDE FILM BY PLASMA ENHANCED ATOMIC LAYER DEPOSITION AT LOW TEMPERATURE
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Assignee
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23-1, 6-CHOME |
NAGAYAMA, TAMA-SHI |
TOKYO, JAPAN 206-0025 |
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Correspondence name and address
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DAMON L. BOYD/SNELL & WILMER
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400 EAST VAN BUREN
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ONE ARIZONA CENTER
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PHOENIX, AZ 85004-2202
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