Patent Assignment Details
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| Reel/Frame: | 023011/0494 | |
| Pages: | 3 |
| | Recorded: | 07/22/2009 | | |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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10/16/2012
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Application #:
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12449060
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Filing Dt:
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07/22/2009
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Publication #:
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Pub Dt:
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03/18/2010
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Title:
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PHOTOSENSITIVE RESIN COMPOSITION, AND PATTERN FORMATION METHOD USING THE SAME
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Assignee
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| 150, NAKAMARUKO, NAKAHARA-KU, KAWASAKI-SHI |
| KANAGAWA 211-0012, JAPAN |
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Correspondence name and address
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WENDEROTH, LIND & PONACK, L.L.P.
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ATTN: WARREN M. CHEEK, ESQ.
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1030 15TH STREET, N.W.
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SUITE 400 EAST
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WASHINGTON, DC 20005-1503
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