Patent Assignment Details
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| Reel/Frame: | 024481/0619 | |
| Pages: | 6 |
| | Recorded: | 06/03/2010 | | |
| Attorney Dkt #: | 04329.4566 |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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05/08/2012
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Application #:
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12749250
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Filing Dt:
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03/29/2010
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Publication #:
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Pub Dt:
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01/27/2011
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Title:
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REFLECTION-TYPE EXPOSURE MASK AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
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Assignees
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| 1-1, SHIBAURA 1-CHOME, MINATO-KU, |
| TOKYO,, JAPAN 105-8001 |
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| 6-2, OTEMACHI 2-CHOME, CHIYODA-KU, |
| TOKYO,, JAPAN 100-0004 |
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Correspondence name and address
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FINNEGAN HENDERSON
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901 NEW YORK AVE., NW
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WASHINGTON, DC 20001
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