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Reel/Frame:025123/0358   Pages: 8
Recorded: 10/12/2010
Attorney Dkt #:OGOSHI-CHANGE OF NAME
Conveyance: CHANGE OF NAME (SEE DOCUMENT FOR DETAILS).
Total properties: 52
1
Patent #:
Issue Dt:
02/15/2011
Application #:
10522273
Filing Dt:
01/25/2005
Publication #:
Pub Dt:
10/20/2005
Title:
HIGH PURITY COPPER SULFATE AND METHOD FOR PRODUCTION THEREOF
2
Patent #:
Issue Dt:
06/21/2011
Application #:
10565767
Filing Dt:
01/24/2006
Publication #:
Pub Dt:
01/25/2007
Title:
HIGHLY PURE HAFNIUM MATERIAL, TARGET THIN FILM COMPRISING THE SAME AND METHOD FOR PRODUCING HIGHLY PURE HAFNIUM
3
Patent #:
Issue Dt:
04/30/2013
Application #:
10566116
Filing Dt:
01/24/2006
Publication #:
Pub Dt:
08/24/2006
Title:
Sputtering target and method for production thereof
4
Patent #:
NONE
Issue Dt:
Application #:
10566300
Filing Dt:
01/25/2006
Publication #:
Pub Dt:
05/17/2007
Title:
Target for sputtering
5
Patent #:
Issue Dt:
05/31/2011
Application #:
10566301
Filing Dt:
01/25/2006
Publication #:
Pub Dt:
05/17/2007
Title:
SPUTTERING TARGET AND METHOD FOR FINISHING SURFACE OF SUCH TARGET
6
Patent #:
Issue Dt:
10/28/2014
Application #:
10570748
Filing Dt:
03/06/2006
Publication #:
Pub Dt:
12/28/2006
Title:
High-purity ni-v alloy target therefrom high-purity ni-v alloy thin film and process for producing high-purity ni-v alloy
7
Patent #:
Issue Dt:
02/22/2011
Application #:
10572252
Filing Dt:
03/17/2006
Publication #:
Pub Dt:
02/01/2007
Title:
TANTALUM SPUTTERING TARGET
8
Patent #:
NONE
Issue Dt:
Application #:
10595660
Filing Dt:
05/03/2006
Publication #:
Pub Dt:
11/30/2006
Title:
High purity hafnium, target and thin film comprising said high purity hafnium, and method for producing high purity hafnium
9
Patent #:
Issue Dt:
10/18/2016
Application #:
10596653
Filing Dt:
06/20/2006
Publication #:
Pub Dt:
03/08/2007
Title:
Copper or copper alloy target/copper alloy backing plate assembly
10
Patent #:
NONE
Issue Dt:
Application #:
10596671
Filing Dt:
06/21/2006
Publication #:
Pub Dt:
05/03/2007
Title:
Ni-pt alloy and target comprising the alloy
11
Patent #:
Issue Dt:
06/05/2012
Application #:
10597449
Filing Dt:
07/26/2006
Publication #:
Pub Dt:
09/18/2008
Title:
ULTRAHIGH-PURITY COPPER AND PROCESS FOR PRODUCING THE SAME
12
Patent #:
Issue Dt:
03/22/2011
Application #:
10598502
Filing Dt:
09/01/2006
Publication #:
Pub Dt:
06/07/2007
Title:
SPUTTERING TARGET WITH FEW SURFACE DEFECTS, AND SURFACE PROCESSING METHOD THEREOF
13
Patent #:
Issue Dt:
04/19/2011
Application #:
10598997
Filing Dt:
09/18/2006
Publication #:
Pub Dt:
08/16/2007
Title:
CO-CR-PT-B ALLOY SPUTTERING TARGET
14
Patent #:
NONE
Issue Dt:
Application #:
11573167
Filing Dt:
02/02/2007
Publication #:
Pub Dt:
09/13/2007
Title:
Barrier Film For Flexible Copper Substrate And Sputtering Target For Forming Barrier Film
15
Patent #:
Issue Dt:
11/19/2013
Application #:
11576577
Filing Dt:
04/03/2007
Publication #:
Pub Dt:
03/27/2008
Title:
High Purity Zrb2 Powder and Manufacturing Method Thereof
16
Patent #:
Issue Dt:
06/20/2017
Application #:
11719013
Filing Dt:
05/10/2007
Publication #:
Pub Dt:
05/22/2008
Title:
SPUTTERING TARGET, SPUTTERING TARGET-BACKING PLATE ASSEMBLY AND DEPOSITION SYSTEM
17
Patent #:
Issue Dt:
03/04/2014
Application #:
11719229
Filing Dt:
05/15/2007
Publication #:
Pub Dt:
06/04/2009
Title:
Sputtering Target for Producing Metallic Glass Membrane and Manufacturing Method Thereof
18
Patent #:
Issue Dt:
05/17/2011
Application #:
11722218
Filing Dt:
06/20/2007
Publication #:
Pub Dt:
02/04/2010
Title:
SB-TE ALLOY SINTERED COMPACT TARGET AND MANUFACTURING METHOD THEREOF
19
Patent #:
Issue Dt:
05/24/2011
Application #:
11813694
Filing Dt:
07/11/2007
Publication #:
Pub Dt:
03/19/2009
Title:
SB-TE ALLOY POWDER FOR SINTERING, SINTERED COMPACT SPUTTERING TARGET OBTAINED BY SINTERING SAID POWDER, AND MANUFACTURING METHOD OF SB-TE ALLOY POWDER FOR SINTERING
20
Patent #:
NONE
Issue Dt:
Application #:
11841165
Filing Dt:
08/20/2007
Publication #:
Pub Dt:
12/27/2007
Title:
Process for Production of Ge-Cr Alloy Sputtering Target
21
Patent #:
Issue Dt:
05/20/2014
Application #:
11909471
Filing Dt:
09/24/2007
Publication #:
Pub Dt:
03/05/2009
Title:
Pot-Shaped Copper Sputtering Target and Manufacturing Method Thereof
22
Patent #:
Issue Dt:
05/15/2012
Application #:
11912450
Filing Dt:
10/24/2007
Publication #:
Pub Dt:
02/05/2009
Title:
SPUTTERING TARGET
23
Patent #:
NONE
Issue Dt:
Application #:
11915628
Filing Dt:
06/17/2009
Publication #:
Pub Dt:
11/05/2009
Title:
Ultrahigh-Purity Copper and Process for Producing the Same, and Bonding Wire Comprising Ultrahigh-Purity Copper
24
Patent #:
Issue Dt:
11/04/2014
Application #:
11916301
Filing Dt:
12/03/2007
Publication #:
Pub Dt:
06/04/2009
Title:
Chromic Oxide Powder for Sputtering Target, and Sputtering Target Manufactured from such Chromic Oxide Powder
25
Patent #:
Issue Dt:
08/15/2017
Application #:
11916860
Filing Dt:
12/07/2007
Publication #:
Pub Dt:
05/07/2009
Title:
RUTHENIUM-ALLOY SPUTTERING TARGET
26
Patent #:
NONE
Issue Dt:
Application #:
11916906
Filing Dt:
12/07/2007
Publication #:
Pub Dt:
04/16/2009
Title:
High-Purity Tin or Tin Alloy and Process for Producing High-Purity Tin
27
Patent #:
NONE
Issue Dt:
Application #:
11917674
Filing Dt:
12/14/2007
Publication #:
Pub Dt:
08/20/2009
Title:
Copper Foil for Printed Wiring Board
28
Patent #:
Issue Dt:
10/02/2012
Application #:
11994167
Filing Dt:
12/28/2007
Publication #:
Pub Dt:
09/10/2009
Title:
HIGH-PURITY HAFNIUM, TARGET AND THIN FILM COMPRISING HIGH-PURITY HAFNIUM, AND PROCESS FOR PRODUCING HIGH-PURITY HAFNIUM
29
Patent #:
Issue Dt:
04/23/2013
Application #:
12088793
Filing Dt:
03/31/2008
Publication #:
Pub Dt:
05/28/2009
Title:
SPUTTERING TARGET
30
Patent #:
Issue Dt:
01/18/2011
Application #:
12088875
Filing Dt:
04/01/2008
Publication #:
Pub Dt:
11/12/2009
Title:
HIGH-PURITY RU ALLOY TARGET, PROCESS FOR PRODUCING THE SAME, AND SPUTTERED FILM
31
Patent #:
NONE
Issue Dt:
Application #:
12137856
Filing Dt:
06/12/2008
Publication #:
Pub Dt:
04/09/2009
Title:
Erbium Sputtering Target and Manufacturing Method
32
Patent #:
Issue Dt:
09/15/2015
Application #:
12159701
Filing Dt:
06/30/2008
Publication #:
Pub Dt:
08/13/2009
Title:
Lithium Nickel Manganese Cobalt Composite Oxide and Lithium Rechargeable Battery
33
Patent #:
Issue Dt:
05/19/2015
Application #:
12160042
Filing Dt:
07/03/2008
Publication #:
Pub Dt:
10/01/2009
Title:
Nonmagnetic Material Particle Dispersed Ferromagnetic Material Sputtering Target
34
Patent #:
Issue Dt:
05/28/2013
Application #:
12188446
Filing Dt:
08/08/2008
Publication #:
Pub Dt:
02/26/2009
Title:
ZIRCONIUM CRUCIBLE
35
Patent #:
NONE
Issue Dt:
Application #:
12202847
Filing Dt:
09/02/2008
Publication #:
Pub Dt:
01/01/2009
Title:
Manufacturing Method of High Purity Nickel, High Purity Nickel, Sputtering Target formed from said High Purity Nickel, and Thin Film formed with said Sputtering Target
36
Patent #:
Issue Dt:
11/22/2011
Application #:
12204069
Filing Dt:
09/04/2008
Publication #:
Pub Dt:
01/01/2009
Title:
HAFNIUM ALLOY TARGET AND PROCESS FOR PRODUCING THE SAME
37
Patent #:
Issue Dt:
08/14/2012
Application #:
12259391
Filing Dt:
10/28/2008
Publication #:
Pub Dt:
02/26/2009
Title:
HAFNIUM ALLOY TARGET
38
Patent #:
Issue Dt:
09/11/2012
Application #:
12259396
Filing Dt:
10/28/2008
Publication #:
Pub Dt:
03/05/2009
Title:
HAFNIUM ALLOY TARGET
39
Patent #:
Issue Dt:
02/22/2011
Application #:
12278889
Filing Dt:
08/08/2008
Publication #:
Pub Dt:
07/01/2010
Title:
NICKEL CRUCIBLE FOR MELTING ANALYTICAL SAMPLE, METHOD OF PREPARING ANALYTICAL SAMPLE AND METHOD OF ANALYSIS
40
Patent #:
Issue Dt:
02/21/2012
Application #:
12279067
Filing Dt:
08/12/2008
Publication #:
Pub Dt:
07/09/2009
Title:
SINTERED SPUTTERING TARGET MADE OF REFRACTORY METALS
41
Patent #:
Issue Dt:
08/02/2011
Application #:
12281847
Filing Dt:
09/08/2008
Publication #:
Pub Dt:
02/26/2009
Title:
METHOD FOR DETERMINING MACHINING PLANE OF PLANAR MATERIAL, MACHINING METHOD AND DEVICE FOR DETERMINING MACHINING PLANE AND FLAT SURFACE MACHINING DEVICE
42
Patent #:
Issue Dt:
11/22/2011
Application #:
12297320
Filing Dt:
10/16/2008
Publication #:
Pub Dt:
07/02/2009
Title:
LITHIUM-CONTAINING TRANSITION METAL OXIDE TARGET, PROCESS FOR PRODUCING THE SAME AND LITHIUM ION THIN FILM SECONDARY BATTERY
43
Patent #:
Issue Dt:
08/21/2012
Application #:
12367572
Filing Dt:
02/09/2009
Publication #:
Pub Dt:
06/04/2009
Title:
COPPER ALLOY SPUTTERING TARGET AND SEMICONDUCTOR ELEMENT WIRING
44
Patent #:
NONE
Issue Dt:
Application #:
12367581
Filing Dt:
02/09/2009
Publication #:
Pub Dt:
06/04/2009
Title:
Copper Alloy Sputtering Target and Semiconductor Element Wiring
45
Patent #:
Issue Dt:
11/27/2012
Application #:
12640075
Filing Dt:
12/17/2009
Publication #:
Pub Dt:
04/15/2010
Title:
BARRIER FILM FOR FLEXIBLE COPPER SUBSTRATE AND SPUTTERING TARGET FOR FORMING BARRIER FILM
46
Patent #:
Issue Dt:
07/10/2012
Application #:
12721625
Filing Dt:
03/11/2010
Publication #:
Pub Dt:
07/01/2010
Title:
ULTRAHIGH-PURITY COPPER AND PROCESS FOR PRODUCING THE SAME
47
Patent #:
Issue Dt:
02/22/2011
Application #:
12721939
Filing Dt:
03/11/2010
Publication #:
Pub Dt:
07/01/2010
Title:
SPUTTERING TARGET, THIN FILM FOR OPTICAL INFORMATION RECORDING MEDIUM AND PROCESS FOR PRODUCING THE SAME
48
Patent #:
Issue Dt:
04/17/2012
Application #:
12775635
Filing Dt:
05/07/2010
Publication #:
Pub Dt:
09/02/2010
Title:
IRON SILICIDE POWDER AND METHOD FOR PRODUCTION THEREOF
49
Patent #:
Issue Dt:
09/19/2017
Application #:
12778283
Filing Dt:
05/12/2010
Publication #:
Pub Dt:
09/02/2010
Title:
Copper Alloy Sputtering Target, Process for Producing the Same and Semiconductor Element Wiring
50
Patent #:
Issue Dt:
03/01/2011
Application #:
12794129
Filing Dt:
06/04/2010
Publication #:
Pub Dt:
09/23/2010
Title:
SPUTTERING TARGET, THIN FILM FOR OPTICAL INFORMATION RECORDING MEDIUM AND PROCESS FOR PRODUCING THE SAME
51
Patent #:
Issue Dt:
05/10/2011
Application #:
12796718
Filing Dt:
06/09/2010
Publication #:
Pub Dt:
09/30/2010
Title:
HIGH-PURITY NI-V ALLOY, TARGET THEREFROM, HIGH-PURITY NI-V ALLOY THIN FILM AND PROCESS FOR PRODUCING HIGH-PURITY NI-V ALLOY
52
Patent #:
Issue Dt:
02/18/2014
Application #:
12854683
Filing Dt:
08/11/2010
Publication #:
Pub Dt:
12/23/2010
Title:
SPUTTERING TARGET FOR PRODUCING METALLIC GLASS MEMBRANE AND MANUFACTURING METHOD THEREOF
Assignor
1
Exec Dt:
07/01/2010
Assignee
1
6-3, OTEMACHI 2-CHOME
CHIYODA-KU
TOKYO, JAPAN 100-8164
Correspondence name and address
WILLIAM BAK, HOWSON & HOWSON LLP
501 OFFICE CENTER DRIVE
SUITE 210
FORT WASHINGTON, PA 19034

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