Patent Assignment Details
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| Reel/Frame: | 025914/0391 | |
| Pages: | 5 |
| | Recorded: | 03/07/2011 | | |
| Attorney Dkt #: | P4910US00 |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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12949790
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Filing Dt:
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11/19/2010
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Publication #:
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Pub Dt:
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06/23/2011
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Title:
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RADIATION-SENSITIVE RESIN COMPOSITION FOR LIQUID IMMERSION LITHOGRAPHY, POLYMER, AND RESIST PATTERN-FORMING METHOD
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Assignee
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| 9-2, HIGASHI-SHINBASHI 1-CHOME, MINATO-KU |
| TOKYO, JAPAN 1058640 |
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Correspondence name and address
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MASAYASU MORI
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918 PRINCE STREET
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ALEXANDRIA, VA 22314
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