Patent Assignment Details
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| Reel/Frame: | 026449/0577 | |
| Pages: | 3 |
| | Recorded: | 05/20/2011 | | |
| Attorney Dkt #: | FPA-2011-0045-ELP-US |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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09/24/2013
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Application #:
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13067285
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Filing Dt:
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05/20/2011
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Publication #:
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Pub Dt:
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12/01/2011
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Title:
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METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE INCLUDING SEQUENTIALLY FORMING FIRST AND SECOND MASK MATERIAL LAYERS AND FORMING A DOTTED PHOTORESIST PATTERN ON THE SECOND MASK MATERIAL LAYER
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Assignee
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| 2-1, YAESU 2-CHOME, CHUO-KU |
| TOKYO, JAPAN 104-0028 |
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Correspondence name and address
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SEAN M. MCGINN, ESQ.
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MCGINN INTELLECTUAL PROPERTY LAW GROUP, PLLC
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8321 OLD COURTHOUSE ROAD, SUITE 200
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VIENNA, VIRGINIA U.S.A. 22182-3817
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