Patent Assignment Details
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| Reel/Frame: | 028688/0922 | |
| Pages: | 4 |
| | Recorded: | 07/31/2012 | | |
| Attorney Dkt #: | 120869 |
| Conveyance: | CORRECTIVE ASSIGNMENT TO CORRECT THE ATTORNEY DOCKET NUMBER PREVIOUSLY RECORDED ON REEL 028657 FRAME 0721. ASSIGNOR(S) HEREBY CONFIRMS THE CHANGE DOCKET NUMBER "120886" TO "120869". |
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Total properties:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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13558855
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Filing Dt:
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07/26/2012
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Publication #:
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Pub Dt:
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02/07/2013
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Title:
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CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION FOR ArF IMMERSION LITHOGRAPHY AND PATTERN FORMING PROCESS
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Assignee
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| 6-1, OHTEMACHI 2-CHOME, CHIYODA-KU |
| TOKYO, JAPAN |
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Correspondence name and address
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WESTERMN, HATTORI, DANIELS & ADRIAN, LL
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1250 CONNECTICUT AVE, NW
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SUITE 700
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WASHINGTON, DC 20036
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