|
Total properties:
20
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|
|
|
Patent #:
|
|
Issue Dt:
|
11/04/1997
|
Application #:
|
08605697
|
Filing Dt:
|
02/22/1996
|
|
Title:
|
INDUCTIVELY COUPLED PLASMA REACTOR AND PROCESS
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
09/11/2001
|
Application #:
|
09009369
|
Filing Dt:
|
01/20/1998
|
|
Title:
|
METHOD FOR USING A HARD MASK FOR CRITICAL DIMENSION GROWTH CONTAINMENT
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
12/28/1999
|
Application #:
|
09204020
|
Filing Dt:
|
12/01/1998
|
|
Title:
|
PLASMA REACTOR WITH A DEPOSITION SHIELD
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
03/26/2002
|
Application #:
|
09382050
|
Filing Dt:
|
08/24/1999
|
|
Title:
|
PLASMA REACTOR WITH A DEPOSITION SHIELD
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
01/16/2001
|
Application #:
|
09434092
|
Filing Dt:
|
11/05/1999
|
|
Title:
|
PLASMA REACTOR WITH A DEPOSITION SHIELD
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
01/09/2001
|
Application #:
|
09434990
|
Filing Dt:
|
11/05/1999
|
|
Title:
|
PLASMA REACTOR WITH A DEPOSITION SHIELD
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
08/13/2002
|
Application #:
|
09634988
|
Filing Dt:
|
08/08/2000
|
|
Title:
|
PLASMA VACUUM SUBSTRATE TREATMENT PROCESS AND SYSTEM
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|
|
|
|
Patent #:
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|
Issue Dt:
|
10/25/2005
|
Application #:
|
09692007
|
Filing Dt:
|
10/19/2000
|
|
Title:
|
METHOD FOR USING A HARD MASK FOR CRITICAL DIMENSION GROWTH CONTAINMENT
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
02/18/2003
|
Application #:
|
09881425
|
Filing Dt:
|
06/14/2001
|
|
Publication #:
|
|
Pub Dt:
|
10/18/2001
| | | | |
|
Title:
|
DEPOSITION SHIELD FOR A PLASMA REACTOR
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|
|
|
|
Patent #:
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|
Issue Dt:
|
10/04/2005
|
Application #:
|
10045318
|
Filing Dt:
|
11/09/2001
|
|
Publication #:
|
|
Pub Dt:
|
09/19/2002
| | | | |
|
Title:
|
METHOD FOR USING A HARD MASK FOR CRITICAL DIMENSION GROWTH CONTAINMENT
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
06/06/2006
|
Application #:
|
10902582
|
Filing Dt:
|
07/30/2004
|
|
Publication #:
|
|
Pub Dt:
|
02/03/2005
| | | | |
|
Title:
|
METHOD AND APPARATUS FOR NON-AGGRESSIVE PLASMA-ENHANCED VAPOR DEPOSITION OF DIELECTRIC FILMS
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
02/22/2011
|
Application #:
|
11319506
|
Filing Dt:
|
12/29/2005
|
|
Publication #:
|
|
Pub Dt:
|
08/10/2006
| | | | |
|
Title:
|
APPARATUS AND A METHOD FOR CONTROLLING THE DEPTH OF ETCHING DURING ALTERNATING PLASMA ETCHING OF SEMICONDUCTOR SUBSTRATES
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|
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|
Patent #:
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|
Issue Dt:
|
07/15/2008
|
Application #:
|
11451443
|
Filing Dt:
|
06/13/2006
|
|
Publication #:
|
|
Pub Dt:
|
12/14/2006
| | | | |
|
Title:
|
METHOD OF CONTROLLING THE PRESSURE IN A PROCESS CHAMBER
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|
|
|
|
Patent #:
|
NONE
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Issue Dt:
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|
Application #:
|
12691785
|
Filing Dt:
|
01/22/2010
|
|
Publication #:
|
|
Pub Dt:
|
07/29/2010
| | | | |
|
Title:
|
METHOD OF PLASMA ETCHING AND CARRIERS FOR USE IN SUCH METHODS
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|
|
|
|
Patent #:
|
NONE
|
Issue Dt:
|
|
Application #:
|
12712339
|
Filing Dt:
|
02/25/2010
|
|
Publication #:
|
|
Pub Dt:
|
08/25/2011
| | | | |
|
Title:
|
Method of forming and patterning conformal insulation layer in vias and etched structures
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|
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|
|
Patent #:
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|
Issue Dt:
|
10/13/2015
|
Application #:
|
12722614
|
Filing Dt:
|
03/12/2010
|
|
Publication #:
|
|
Pub Dt:
|
09/16/2010
| | | | |
|
Title:
|
APPARATUS FOR CHEMICALLY ETCHING A WORKPIECE
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|
Patent #:
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Issue Dt:
|
06/04/2013
|
Application #:
|
12934276
|
Filing Dt:
|
10/28/2010
|
|
Publication #:
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|
Pub Dt:
|
02/24/2011
| | | | |
|
Title:
|
METHOD OF DEPOSITING AMORPHUS ALUMINIUM OXYNITRIDE LAYER BY REACTIVE SPUTTERING OF AN ALUMINIUM TARGET IN A NITROGEN/OXYGEN ATMOSPHERE
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|
|
Patent #:
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|
Issue Dt:
|
03/03/2015
|
Application #:
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12967304
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Filing Dt:
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12/14/2010
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Publication #:
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Pub Dt:
|
06/16/2011
| | | | |
|
Title:
|
ION BEAM SOURCE
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|
|
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|
Patent #:
|
NONE
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Issue Dt:
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|
Application #:
|
12972602
|
Filing Dt:
|
12/20/2010
|
|
Publication #:
|
|
Pub Dt:
|
12/29/2011
| | | | |
|
Title:
|
METHODS OF DEPOSITING SIO2 FILMS
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|
|
|
|
Patent #:
|
NONE
|
Issue Dt:
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|
Application #:
|
13054033
|
Filing Dt:
|
03/09/2011
|
|
Publication #:
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|
Pub Dt:
|
11/03/2011
| | | | |
|
Title:
|
GAS DELIVERY DEVICE
|
|
