Patent Assignment Details
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| Reel/Frame: | 031014/0171 | |
| Pages: | 2 |
| | Recorded: | 08/14/2013 | | |
| Attorney Dkt #: | SCI-101034 |
| Conveyance: | CHANGE OF ADDRESS OF ASSIGNEE |
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Total properties:
1
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Patent #:
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Issue Dt:
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12/03/2013
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Application #:
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12742381
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Filing Dt:
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08/24/2010
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Publication #:
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Pub Dt:
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12/09/2010
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Title:
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ETCHING MASK, BASE MATERIAL HAVING ETCHING MASK, FINELY PROCESSED ARTICLE, AND METHOD FOR PRODUCTION OF FINELY PROCESSED ARTICLE
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Assignee
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| 1-1, IRIFUNE 2-CHOME |
| CHUO-KU |
| TOKYO, JAPAN 104-8502 |
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Correspondence name and address
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FACTOR INTELLECTUAL PROPERTY LAW GROUP,
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1327 W. WASHINGTON BLVD.
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SUITE 5G/H
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CHICAGO, IL 60607
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