Patent Assignment Details
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| Reel/Frame: | 034171/0438 | |
| Pages: | 3 |
| | Recorded: | 11/14/2014 | | |
| Attorney Dkt #: | Q214117 |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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11/27/2018
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Application #:
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14540454
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Filing Dt:
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11/13/2014
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Publication #:
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Pub Dt:
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03/12/2015
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Title:
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CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM USING THE SAME, RESIST-COATED MASK BLANK, METHOD OF FORMING PHOTOMASK AND PATTERN, AND METHOD OF MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE
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Assignee
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| 26-30, NISHIAZABU 2-CHOME |
| MINATO-KU, TOKYO, JAPAN 106-8620 |
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Correspondence name and address
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SUGHRUE MION, PLLC
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2100 PENNSYLVANIA AVENUE NW
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WASHINGTON, DC 20037
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