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Patent #:
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Issue Dt:
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05/28/1996
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Application #:
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08365659
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Filing Dt:
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12/30/1994
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Title:
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METAL ION REDUCTION IN NOVOLAK RESIN USING AN ION EXCHANGE CATALYST IN A POLAR SOLVENT AND PHOTORESISTS COMPOSITIONS THEREFROM
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Patent #:
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Issue Dt:
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01/21/1997
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Application #:
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08390045
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Filing Dt:
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02/17/1995
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Title:
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RADIATION SENSITIVE COMPOSITION
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Patent #:
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Issue Dt:
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09/02/1997
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Application #:
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08420787
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Filing Dt:
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04/12/1995
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Title:
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RADIATION-SENSITIVE MIXTURE COMPRISING A BASIC IODONIUM COMPOUND
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Patent #:
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Issue Dt:
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01/21/1997
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Application #:
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08516562
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Filing Dt:
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08/18/1995
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Title:
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SILICON-CONTAINING COPOLYMER AND METHOD OF PRODUCING SAME
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Patent #:
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Issue Dt:
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03/31/1998
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Application #:
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08724109
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Filing Dt:
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09/30/1996
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Title:
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ANTIREFLECTIVE COATING FOR PHOTORESIST COMPOSITIONS
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Patent #:
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Issue Dt:
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07/13/1999
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Application #:
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08793943
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Filing Dt:
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03/07/1997
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Title:
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COMPOSITION FOR FORMING CERAMIC MATERIAL AND PROCESS FOR PRODUCING CERAMIC MATERIAL
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Patent #:
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Issue Dt:
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03/28/2000
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Application #:
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08811806
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Filing Dt:
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03/06/1997
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Title:
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BOTTOM ANTIREFLECTIVE COATINGS THROUGH REFRACTIVE INDEX MODIFICATION BY ANOMALOUS DISPERSION
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Patent #:
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Issue Dt:
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09/29/1998
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Application #:
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08833170
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Filing Dt:
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04/03/1997
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Title:
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USE OF MIXTURES OF ETHYL LACTATE AND N-METHYL PYROLLIDONE AS AN EDGE BEAD REMOVER FOR PHOTORESISTS
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Patent #:
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Issue Dt:
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12/29/1998
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Application #:
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08838665
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Filing Dt:
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04/09/1997
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Title:
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COMPOSITION FOR ANTI-REFLECTION COATING
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Patent #:
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Issue Dt:
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11/30/1999
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Application #:
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08841750
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Filing Dt:
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04/30/1997
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Title:
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ANTIREFLECTIVE COATING COMPOSITIONS FOR PHOTORESIST COMPOSITIONS AND USE THEREOF
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Patent #:
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Issue Dt:
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11/09/1999
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Application #:
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08846986
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Filing Dt:
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04/30/1997
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Title:
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LIGHT ABSORBING POLYMERS
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Patent #:
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Issue Dt:
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08/29/2000
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Application #:
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08860451
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Filing Dt:
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06/26/1997
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Title:
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RADIATION-SENSITIVE COMPOSITION AND RECORDING MEDIUM USING THE SAME
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Patent #:
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Issue Dt:
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05/18/1999
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Application #:
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08894663
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Filing Dt:
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08/25/1997
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Title:
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PROCESS FOR THE PRODUCTION OF POLYSILAZANE
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Patent #:
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Issue Dt:
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12/22/1998
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Application #:
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08922321
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Filing Dt:
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09/03/1997
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Title:
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NEW ACID-LABILE GROUP PROTECTED HYDROXYSTYRENE POLYMERS OR COPOLYMERS THEREOF AND THEIR APPLICATION TO RADIATION SENSITIVE MATERIALS
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Patent #:
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Issue Dt:
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03/28/2000
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Application #:
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08941188
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Filing Dt:
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09/30/1997
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Title:
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NEW CHEMICAL MECHANICAL POLISHING FOR LAYERS OF ISOLATING MATERIALS BASED ON SILICON DERIVATIVES OR SILICON
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Patent #:
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Issue Dt:
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10/05/1999
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Application #:
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08955453
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Filing Dt:
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10/21/1997
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Title:
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RADIATION SENSITIVE COMPOSITION
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Patent #:
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Issue Dt:
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07/04/2000
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Application #:
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09005925
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Filing Dt:
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01/12/1998
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Title:
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METHOD AND COMPOSITION FOR FORMING CERAMICS AND ARTICLE CATED WITH THE CERAMICS
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Patent #:
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Issue Dt:
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10/03/2000
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Application #:
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09054518
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Filing Dt:
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04/03/1998
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Title:
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CHEMICAL MECHANICAL POLISHING PROCESS FOR LAYERS OF SEMICONDUCTOR OR ISOLATING MATERIALS
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Patent #:
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Issue Dt:
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04/09/2002
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Application #:
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09113892
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Filing Dt:
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07/10/1998
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Title:
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COMPOSITION FOR STRIPPING PHOTORESIST AND ORGANIC MATERIALS FROM SUBSTRATE SURFACES
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Patent #:
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Issue Dt:
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01/04/2000
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Application #:
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09125874
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Filing Dt:
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08/26/1998
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Title:
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POLYORGANOSILOXAZANES AND PROCESS FOR THE PREPARATION THEREOF
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Patent #:
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Issue Dt:
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09/05/2000
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Application #:
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09195057
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Filing Dt:
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11/18/1998
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Title:
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ANTIREFLECTIVE COMPOSITION FOR A DEEP ULTRAVIOLET PHOTORESIST
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Patent #:
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Issue Dt:
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10/12/2004
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Application #:
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09237125
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Filing Dt:
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01/26/1999
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Title:
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COMPOSITION FOR ANTI-REFLECTIVE COATING OR RADIATION ABSORBING COATING AND COMPOUNDS USED IN THE COMPOSITION
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Patent #:
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Issue Dt:
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06/27/2000
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Application #:
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09242942
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Filing Dt:
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02/26/1999
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Title:
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RADIATION-SENSITIVE RESIST COMPOSITION WITH HIGH HEAT RESISTANCE
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Patent #:
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Issue Dt:
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10/22/2002
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Application #:
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09244358
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Filing Dt:
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02/04/1999
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Title:
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RADIATION ABSORBING POLYMER, COMPOSITION FOR RADIATION ABSORBING COATING, RADIATION ABSORBING COATING AND APPLICATION THEREOF AS ANTI-REFLECTIVE COATING
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Patent #:
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Issue Dt:
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08/14/2001
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Application #:
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09264616
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Filing Dt:
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03/08/1999
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Title:
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LIGHT-ABSORBING ANTIREFLECTIVE LAYERS WITH IMPROVED PERFORMANCE DUE TO REFRACTIVE INDEX OPTIMIZATION
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Patent #:
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Issue Dt:
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09/04/2001
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Application #:
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09308582
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Filing Dt:
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08/05/1999
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Title:
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NOVEL PROCESS FOR PREPARING RESISTS
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|
|
|
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Patent #:
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Issue Dt:
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12/11/2001
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Application #:
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09319129
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Filing Dt:
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08/09/1999
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Title:
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ANTIREFLECTION OR LIGHT-ABSORBING COATING COMPOSITION AND POLYMER THEREFOR
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Patent #:
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Issue Dt:
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10/16/2001
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Application #:
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09365176
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Filing Dt:
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08/02/1999
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|
Title:
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PROCESS FOR MECHANICAL CHEMICAL POLISHING OF A LAYER IN A COPPER-BASED MATERIAL
|
|
|
|
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Patent #:
|
|
Issue Dt:
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02/13/2001
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Application #:
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09368740
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Filing Dt:
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08/05/1999
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|
Title:
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ANTIREFLECTIVE COATING FOR PHOTORESIST COMPOSITIONS
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
02/12/2002
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Application #:
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09413181
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Filing Dt:
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10/06/1999
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|
Title:
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METHOD FOR SYNTHESIZING POLYMERIC AZO DYES
|
|
|
|
|
Patent #:
|
|
Issue Dt:
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07/03/2001
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Application #:
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09424128
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Filing Dt:
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03/23/2000
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Title:
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LIGHT-ABSORBING POLYMERS AND APPLICATION THEREOF TO ANTIREFLECTION FILM
|
|
|
|
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Patent #:
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Issue Dt:
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12/05/2006
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Application #:
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09427675
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Filing Dt:
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10/27/1999
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|
Publication #:
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Pub Dt:
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10/03/2002
| | | | |
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Title:
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ABRASIVE COMPOSITION FOR THE INTEGRATED CIRCUITS ELECTRONICS INDUSTRY
|
|
|
|
|
Patent #:
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Issue Dt:
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11/12/2002
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Application #:
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09445345
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Filing Dt:
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04/03/2000
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|
Publication #:
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Pub Dt:
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11/01/2001
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Title:
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CHEMICALLY AMPLIFIED RESIST COMPOSITION
|
|
|
|
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Patent #:
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|
Issue Dt:
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10/30/2001
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Application #:
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09485174
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Filing Dt:
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02/07/2000
|
|
Title:
|
AMINATED POLYSILAZANE AND PROCESS FOR THE PREPARATION THEREOF
|
|
|
|
|
Patent #:
|
|
Issue Dt:
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10/15/2002
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Application #:
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09486843
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Filing Dt:
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05/23/2000
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Title:
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COMPOSITION FOR LIGHT ABSORPTION FILM FORMATION CONTAINING BLOCKED ISOCYANATE COMPOUND AND ANTIREFLECTION FILM FORMED THEREFROM
|
|
|
|
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Patent #:
|
|
Issue Dt:
|
05/14/2002
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Application #:
|
09506045
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Filing Dt:
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02/17/2000
|
|
Title:
|
PROCESS FOR MECHANICAL CHEMICAL POLISHING OF LAYER OF ALUMINIUM OR ALUMINIUM ALLOY CONDUCTING MATERIAL
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
03/19/2002
|
Application #:
|
09529371
|
Filing Dt:
|
07/03/2000
|
|
Title:
|
RADIATION-SENSITIVE COMPOSITION OF CHEMICAL AMPLIFICATION TYPE
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
03/26/2002
|
Application #:
|
09553037
|
Filing Dt:
|
04/20/2000
|
|
Title:
|
Composition for mechanical chemical polishing of layers in an insulating material based on a polymer with a low dielectric constant
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
06/10/2003
|
Application #:
|
09596098
|
Filing Dt:
|
06/16/2000
|
|
Title:
|
NEGATIVE-ACTING CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
02/25/2003
|
Application #:
|
09693215
|
Filing Dt:
|
10/20/2000
|
|
Title:
|
EDGE BEAD REMOVER FOR THICK FILM PHOTORESISTS
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
04/29/2003
|
Application #:
|
09786245
|
Filing Dt:
|
02/28/2001
|
|
Title:
|
WATER-SOLUBLE RESIN COMPOSITION
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
02/03/2004
|
Application #:
|
09824198
|
Filing Dt:
|
04/02/2001
|
|
Publication #:
|
|
Pub Dt:
|
09/27/2001
| | | | |
|
Title:
|
NOVEL PROCESS FOR PREPARING RESISTS
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
10/05/2004
|
Application #:
|
09966958
|
Filing Dt:
|
09/28/2001
|
|
Publication #:
|
|
Pub Dt:
|
04/24/2003
| | | | |
|
Title:
|
NEGATIVE- ACTING AQUEOUS PHOTORESIST COMPOSITION
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
01/18/2005
|
Application #:
|
10042532
|
Filing Dt:
|
01/09/2002
|
|
Publication #:
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Pub Dt:
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07/10/2003
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Title:
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POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
07/04/2006
|
Application #:
|
10042878
|
Filing Dt:
|
01/09/2002
|
|
Publication #:
|
|
Pub Dt:
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07/10/2003
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|
Title:
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PROCESS FOR PRODUCING AN IMAGE USING A FIRST MINIMUM BOTTOM ANTIREFLECTIVE COATING COMPOSITION
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
06/07/2005
|
Application #:
|
10110656
|
Filing Dt:
|
08/28/2002
|
|
Publication #:
|
|
Pub Dt:
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06/19/2003
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|
Title:
|
PHOTOSENSITIVE PLOYSILAZANE COMPOSITION, METHOD OF FORMING PATTERN THEREFROM, AND METHOD OF BURNING COATING FILM THEREOF
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
06/28/2005
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Application #:
|
10120952
|
Filing Dt:
|
04/11/2002
|
|
Publication #:
|
|
Pub Dt:
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10/16/2003
| | | | |
|
Title:
|
PHOTORESIST COMPOSITIONS COMPRISING ACETALS AND KETALS AS SOLVENTS
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
05/18/2004
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Application #:
|
10229219
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Filing Dt:
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08/27/2002
|
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Publication #:
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Pub Dt:
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04/03/2003
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Title:
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RADIATION ABSORBING POLYMER, COMPOSITION FOR RADIATION ABSORBING COATING, RADIATION ABSORBING COATING AND APPLICATION THEREOF AS ANTI-REFLECTIVE COATING
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|
|
|
|
Patent #:
|
|
Issue Dt:
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09/06/2005
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Application #:
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10232081
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Filing Dt:
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08/30/2002
|
|
Publication #:
|
|
Pub Dt:
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02/06/2003
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Title:
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BLOCKED ISOCYANATE COMPOUND-CONTAINING COMPOSITION FOR FORMING A RADIATION ABSORBING COATING AND ANTI-REFLECTIVE COATING FORMED THEREFROM
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
07/27/2004
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Application #:
|
10258285
|
Filing Dt:
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10/23/2002
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|
Title:
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METHOD FOR SEALING FINE GROOVE WITH SILICEOUS MATERIAL AND SUBSTRATE HAVING SILICEOUS COATING FORMED THEREON
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
09/04/2007
|
Application #:
|
10301462
|
Filing Dt:
|
11/21/2002
|
|
Publication #:
|
|
Pub Dt:
|
05/27/2004
| | | | |
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Title:
|
ANTIREFLECTIVE COMPOSITIONS FOR PHOTORESISTS
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
03/27/2007
|
Application #:
|
10311787
|
Filing Dt:
|
12/18/2002
|
|
Publication #:
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|
Pub Dt:
|
09/25/2003
| | | | |
|
Title:
|
DEVELOPMENT DEFFECT PREVENTING PROCESS AND MATERIAL
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
06/08/2004
|
Application #:
|
10370588
|
Filing Dt:
|
02/24/2003
|
|
Publication #:
|
|
Pub Dt:
|
08/14/2003
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|
Title:
|
POROUS SILICA COATING WITH LOW DIELECTRIC CONSTANT, SEMICONDUCTOR DEVICE AND COATING COMPOSITION
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
02/08/2005
|
Application #:
|
10393925
|
Filing Dt:
|
03/21/2003
|
|
Publication #:
|
|
Pub Dt:
|
09/23/2004
| | | | |
|
Title:
|
PHOTORESIST COMPOSITION FOR IMAGING THICK FILMS
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
08/02/2005
|
Application #:
|
10395747
|
Filing Dt:
|
03/24/2003
|
|
Publication #:
|
|
Pub Dt:
|
10/09/2003
| | | | |
|
Title:
|
ASSEMBLY SYSTEM FOR STATIONING SEMICONDUCTOR WAFER SUITABLE FOR PROCESSING AND PROCESS FOR MANUFACTURING SEMICONDUCTOR WAFER
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
09/20/2005
|
Application #:
|
10399928
|
Filing Dt:
|
04/24/2003
|
|
Publication #:
|
|
Pub Dt:
|
02/12/2004
| | | | |
|
Title:
|
SILICON-CONTAINING COPOLYMER AND PROCESS FOR PRODUCING THE SAME
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
03/28/2006
|
Application #:
|
10416412
|
Filing Dt:
|
05/08/2003
|
|
Publication #:
|
|
Pub Dt:
|
03/18/2004
| | | | |
|
Title:
|
METHOD FOR FORMING PATTERN AND TREATING AGENT FOR USE THEREIN
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
01/31/2006
|
Application #:
|
10439472
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Filing Dt:
|
05/16/2003
|
|
Publication #:
|
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Pub Dt:
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12/25/2003
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Title:
|
PHOTORESIST COMPOSITION FOR DEEP ULTRAVIOLET LITHOGRAPHY COMPRISING A MIXTURE OF PHOTOACTIVE COMPOUNDS
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
12/08/2009
|
Application #:
|
10451931
|
Filing Dt:
|
06/25/2003
|
|
Publication #:
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Pub Dt:
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03/18/2004
| | | | |
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Title:
|
PROCESS FOR THE PREPARATION OF AQUEOUS SUSPENSIONS OF ANIONIC COLLOIDAL SILICA HAVING A NEUTRAL PH AND APPLICATIONS THEREOF
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
03/07/2006
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Application #:
|
10459229
|
Filing Dt:
|
06/11/2003
|
|
Publication #:
|
|
Pub Dt:
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12/16/2004
| | | | |
|
Title:
|
MODIFIED ALGINIC ACID OF ALGINIC ACID DERIVATIVES AND THERMOSETTING ANTI-REFLECTIVE COMPOSITIONS THEREOF
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
11/28/2006
|
Application #:
|
10487658
|
Filing Dt:
|
02/23/2004
|
|
Publication #:
|
|
Pub Dt:
|
12/02/2004
| | | | |
|
Title:
|
ETCHING METHOD AND COMPOSITION FOR FORMING ETCHING PROTECTIVE LAYER
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
03/18/2008
|
Application #:
|
10499374
|
Filing Dt:
|
06/16/2004
|
|
Publication #:
|
|
Pub Dt:
|
02/03/2005
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Title:
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SOLVENT FOR TREATING POLYSILAZANE AND METHOD OF TREATING POLYSILAZANE WITH THE SOLVENT
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Patent #:
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Issue Dt:
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02/06/2007
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Application #:
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10500752
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Filing Dt:
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07/01/2004
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Publication #:
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Pub Dt:
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06/02/2005
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Title:
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CLEANING AGENT COMPOSITION FOR A POSITIVE OR A NEGATIVE PHOTORESIST
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Patent #:
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Issue Dt:
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07/18/2006
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Application #:
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10500986
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Filing Dt:
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07/06/2004
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Publication #:
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Pub Dt:
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04/21/2005
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Title:
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PROCESS FOR CHEMICAL-MECHANICAL POLISHING OF METAL SUBSTRATES
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Patent #:
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Issue Dt:
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05/13/2008
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Application #:
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10506855
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Filing Dt:
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09/02/2004
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Publication #:
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Pub Dt:
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06/09/2005
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Title:
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COMPOSITION OF SILICON-CONTAINING COPOLYMER, SOLVENT-SOLUBLE CROSSLINKED SILICON-CONTAINING COPOLYMER, AND CURED ARTICLES OBTAINED THEREFORM
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Patent #:
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Issue Dt:
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09/21/2010
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Application #:
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10518105
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Filing Dt:
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12/10/2004
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Publication #:
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Pub Dt:
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10/06/2005
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Title:
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PROCESS FOR PREVENTING DEVELOPMENT DEFECT AND COMPOSITION FOR USE IN THE SAME
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Patent #:
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Issue Dt:
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04/29/2008
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Application #:
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10519242
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Filing Dt:
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12/22/2004
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Publication #:
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Pub Dt:
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10/27/2005
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Title:
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COMPOSITION FOR ANTIREFLECTION COATING AND METHOD FOR FORMING PATTERN
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Patent #:
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Issue Dt:
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08/14/2007
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Application #:
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10532364
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Filing Dt:
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04/20/2005
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Publication #:
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Pub Dt:
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12/08/2005
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Title:
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CHEMICALLY AMPLIFIED POSITIVE PHOTOSENSITIVE RESIN COMPOSITION
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Patent #:
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Issue Dt:
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02/26/2008
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Application #:
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10546334
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Filing Dt:
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08/18/2005
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Publication #:
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Pub Dt:
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07/20/2006
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Title:
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WATER SOLUBLE RESIN COMPOSITION, METHOD OF PATTERN FORMATION AND METHOD OF INSPECTING RESIST PATTERN
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Patent #:
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Issue Dt:
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10/06/2009
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Application #:
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10550110
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Filing Dt:
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09/19/2005
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Publication #:
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Pub Dt:
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09/21/2006
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Title:
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PROTECTED POLYVINYL ALCOHOL AUXILIARY FOR FORMING FINE PATTERN AND PROCESS FOR PRODUCING THE SAME
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Patent #:
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Issue Dt:
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05/06/2008
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Application #:
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10564336
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Filing Dt:
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01/11/2006
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Publication #:
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Pub Dt:
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09/28/2006
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Title:
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PHOSPHORUS-CONTAINING SILAZANE COMPOSITION, PHOSPHORUS-CONTAINING SILICEOUS FILM, PHOSPHORUS-CONTAINING SILICEOUS FILLER, METHOD FOR PRODUCING PHOSPHORUS-CONTAINING SILICEOUS FILM, AND SEMICONDUCTOR DEVICE
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Patent #:
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Issue Dt:
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07/15/2008
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Application #:
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10565113
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Filing Dt:
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01/17/2006
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Publication #:
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Pub Dt:
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08/17/2006
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Title:
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MATERIAL FOR FORMING FINE PATTERN AND METHOD FOR FORMING FINE PATTERN USING THE SAME
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Patent #:
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Issue Dt:
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07/13/2010
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Application #:
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10565429
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Filing Dt:
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01/18/2006
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Publication #:
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Pub Dt:
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11/02/2006
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Title:
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COATING COMPOSITION AND LOW DIELECTRIC SILICEOUS MATERIAL PRODUCED BY USING SAME
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Patent #:
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Issue Dt:
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03/13/2007
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Application #:
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10734022
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Filing Dt:
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12/11/2003
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Publication #:
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Pub Dt:
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06/16/2005
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Title:
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PHOTORESIST COMPOSITION FOR DEEP UV AND PROCESS THEREOF
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Patent #:
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Issue Dt:
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04/25/2006
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Application #:
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10748778
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Filing Dt:
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12/29/2003
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Publication #:
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Pub Dt:
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07/07/2005
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Title:
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PHOTORESIST COMPOSITION
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Patent #:
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Issue Dt:
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07/25/2006
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Application #:
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10817987
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Filing Dt:
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04/05/2004
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Publication #:
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Pub Dt:
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10/20/2005
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Title:
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PROCESS FOR MAKING POLYESTERS
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Patent #:
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Issue Dt:
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10/17/2006
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Application #:
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10909513
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Filing Dt:
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08/02/2004
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Publication #:
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Pub Dt:
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02/02/2006
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Title:
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PHOTORESIST COMPOSITIONS
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Patent #:
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Issue Dt:
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09/29/2009
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Application #:
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10973633
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Filing Dt:
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10/26/2004
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Publication #:
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Pub Dt:
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04/27/2006
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Title:
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COMPOSITION FOR COATING OVER A PHOTORESIST PATTERN
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Patent #:
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Issue Dt:
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05/26/2009
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Application #:
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10994745
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Filing Dt:
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11/22/2004
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Publication #:
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Pub Dt:
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05/25/2006
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Title:
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PHOTORESIST COMPOSITION FOR DEEP UV AND PROCESS THEREOF
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Patent #:
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Issue Dt:
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01/06/2009
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Application #:
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11044305
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Filing Dt:
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01/27/2005
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Publication #:
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Pub Dt:
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09/15/2005
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Title:
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PROCESS OF IMAGING A DEEP ULTRAVIOLET PHOTORESIST WITH A TOP COATING AND MATERIALS THEREOF
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Patent #:
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Issue Dt:
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04/28/2009
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Application #:
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11103093
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Filing Dt:
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04/11/2005
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Publication #:
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Pub Dt:
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10/12/2006
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Title:
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NANOCOMPOSITE PHOTORESIST COMPOSITION FOR IMAGING THICK FILMS
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Patent #:
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Issue Dt:
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07/24/2007
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Application #:
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11103134
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Filing Dt:
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04/11/2005
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Publication #:
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Pub Dt:
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10/12/2006
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Title:
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NANOCOMPOSITE PHOTOSENSITIVE COMPOSITION AND USE THEREOF
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Patent #:
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Issue Dt:
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04/06/2010
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Application #:
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11159002
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Filing Dt:
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06/22/2005
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Publication #:
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Pub Dt:
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03/16/2006
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Title:
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ANTIREFLECTIVE COMPOSITIONS FOR PHOTORESISTS
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Patent #:
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Issue Dt:
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08/14/2007
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Application #:
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11179364
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Filing Dt:
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07/12/2005
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Publication #:
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Pub Dt:
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01/18/2007
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Title:
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PHOTORESIST COMPOSITION FOR IMAGING THICK FILMS
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Patent #:
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Issue Dt:
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06/30/2009
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Application #:
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11262639
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Filing Dt:
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10/31/2005
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Publication #:
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Pub Dt:
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05/03/2007
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Title:
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ANTI-REFLECTIVE COATINGS
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Patent #:
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Issue Dt:
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03/16/2010
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Application #:
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11355400
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Filing Dt:
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02/16/2006
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Publication #:
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Pub Dt:
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05/17/2007
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Title:
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PHOTOACTIVE COMPOUNDS
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Patent #:
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Issue Dt:
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04/21/2009
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Application #:
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11355762
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Filing Dt:
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02/16/2006
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Publication #:
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Pub Dt:
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01/18/2007
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Title:
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PHOTOACTIVE COMPOUNDS
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Patent #:
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Issue Dt:
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10/13/2009
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Application #:
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11390716
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Filing Dt:
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03/28/2006
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Publication #:
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Pub Dt:
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10/04/2007
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Title:
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NEGATIVE PHOTORESIST COMPOSITIONS
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Patent #:
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Issue Dt:
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12/29/2009
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Application #:
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11502706
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Filing Dt:
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08/10/2006
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Publication #:
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Pub Dt:
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02/14/2008
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Title:
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ANTIREFLECTIVE COMPOSITION FOR PHOTORESISTS
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Patent #:
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Issue Dt:
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08/26/2008
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Application #:
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11527862
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Filing Dt:
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09/27/2006
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Publication #:
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Pub Dt:
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03/27/2008
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Title:
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ANTIREFLECTIVE COATING COMPOSITIONS
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Patent #:
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Issue Dt:
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06/29/2010
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Application #:
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11547707
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Filing Dt:
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10/05/2006
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Publication #:
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Pub Dt:
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08/14/2008
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Title:
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WATER SOLUBLE RESIN COMPOSITION AND METHOD FOR PATTERN FORMATION USING THE SAME
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Patent #:
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Issue Dt:
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02/23/2010
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Application #:
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11550459
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Filing Dt:
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10/18/2006
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Publication #:
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Pub Dt:
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04/24/2008
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Title:
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ANTIREFLECTIVE COATING COMPOSITIONS
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Patent #:
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Issue Dt:
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06/24/2008
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Application #:
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11566309
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Filing Dt:
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12/04/2006
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Publication #:
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Pub Dt:
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06/05/2008
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Title:
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PHOTOACTIVE COMPOUNDS
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Patent #:
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Issue Dt:
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02/17/2009
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Application #:
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11566312
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Filing Dt:
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12/04/2006
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Publication #:
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Pub Dt:
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06/05/2008
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Title:
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PHOTOACTIVE COMPOUNDS
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Patent #:
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Issue Dt:
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10/13/2009
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Application #:
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11613403
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Filing Dt:
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12/20/2006
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Publication #:
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Pub Dt:
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06/26/2008
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Title:
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PHOTOACTIVE COMPOUNDS
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Patent #:
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Issue Dt:
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07/20/2010
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Application #:
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11613410
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Filing Dt:
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12/20/2006
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Publication #:
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Pub Dt:
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06/26/2008
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Title:
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ANTIREFLECTIVE COATING COMPOSITIONS
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Patent #:
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Issue Dt:
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09/27/2011
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Application #:
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11619208
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Filing Dt:
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01/03/2007
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Publication #:
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Pub Dt:
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07/03/2008
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Title:
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STRIPPER FOR COATING LAYER
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Patent #:
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Issue Dt:
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11/02/2010
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Application #:
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11624744
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Filing Dt:
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01/19/2007
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Publication #:
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Pub Dt:
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07/24/2008
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Title:
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SOLVENT MIXTURES FOR ANTIREFLECTIVE COATING COMPOSITIONS FOR PHOTORESISTS
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Patent #:
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Issue Dt:
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09/22/2009
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Application #:
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11660199
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Filing Dt:
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02/13/2007
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Publication #:
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Pub Dt:
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10/25/2007
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Title:
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METHOD FOR FINE PATTERN FORMATION
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Patent #:
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Issue Dt:
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01/11/2011
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Application #:
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11664342
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Filing Dt:
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03/29/2007
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Publication #:
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Pub Dt:
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04/17/2008
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Title:
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PHOTORESIST COATING LIQUID SUPPLYING APPARATUS, AND PHOTORESIST COATING LIQUID SUPPLYING METHOD AND PHOTORESIST COATING APPARATUS USING SUCH PHOTORESIST COATING LIQUID SUPPLYING APPARATUS
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