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Total properties:
19
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Patent #:
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Issue Dt:
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01/11/2011
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Application #:
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11350022
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Filing Dt:
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02/08/2006
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Publication #:
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Pub Dt:
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02/08/2007
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Title:
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RF MATCHING NETWORK OF A VACUUM PROCESSING CHAMBER AND CORRESPONDING CONFIGURATION METHODS
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Patent #:
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Issue Dt:
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04/14/2009
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Application #:
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11351786
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Filing Dt:
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02/09/2006
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Publication #:
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Pub Dt:
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02/15/2007
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Title:
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MULTI-STATION WORKPIECE PROCESSORS, METHODS OF PROCESSING SEMICONDUCTOR WORKPIECES WITHIN MULTI-STATION WORKPIECE PROCESSORS, AND METHODS OF MOVING SEMICONDUCTOR WORKPIECES WITHIN MULTI-STATION WORKPIECE PROCESSORS
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Patent #:
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Issue Dt:
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03/23/2010
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Application #:
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11440738
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Filing Dt:
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05/24/2006
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Publication #:
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Pub Dt:
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02/22/2007
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Title:
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VACUUM PROCESSING CHAMBER AND METHOD OF PROCESSING A SEMICONDUCTOR WORK PIECE
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Patent #:
|
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Issue Dt:
|
05/06/2014
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Application #:
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11440747
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Filing Dt:
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05/24/2006
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Publication #:
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Pub Dt:
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02/08/2007
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Title:
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SEMICONDUCTOR PROCESSING SYSTEM; A SEMICONDUCTOR PROCESSING CHAMBER; AND A METHOD FOR LOADING, UNLOADING AND EXCHANGING SEMICONDUCTOR WORK PIECES FROM A SEMICONDUCTOR PROCESSING CHAMBER
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Patent #:
|
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Issue Dt:
|
05/03/2011
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Application #:
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11441290
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Filing Dt:
|
05/24/2006
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Publication #:
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Pub Dt:
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02/08/2007
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Title:
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PLASMA PROCESSING APPARATUS
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Patent #:
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Issue Dt:
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12/17/2013
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Application #:
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11546041
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Filing Dt:
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10/10/2006
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Publication #:
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Pub Dt:
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04/19/2007
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Title:
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Plasma confinement apparatus, and method for confining a plasma
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Patent #:
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Issue Dt:
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02/09/2010
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Application #:
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11602568
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Filing Dt:
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11/20/2006
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Publication #:
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Pub Dt:
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04/24/2008
| | | | |
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Title:
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GAS DISTRIBUTION ASSEMBLY FOR USE IN A SEMICONDUCTOR WORK PIECE PROCESSING REACTOR
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Patent #:
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Issue Dt:
|
08/09/2011
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Application #:
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11689318
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Filing Dt:
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03/21/2007
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Publication #:
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Pub Dt:
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08/28/2008
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Title:
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SILICON CARBIDE GAS DISTRIBUTION PLATE AND RF ELECTRODE FOR PLASMA ETCH CHAMBER
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Patent #:
|
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Issue Dt:
|
03/17/2009
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Application #:
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11739785
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Filing Dt:
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04/25/2007
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Publication #:
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Pub Dt:
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10/16/2008
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Title:
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MULTIPLE FREQUENCY PLASMA CHAMBER, SWITCHABLE RF SYSTEM, AND PROCESSES USING SAME
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Patent #:
|
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Issue Dt:
|
02/05/2013
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Application #:
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11772726
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Filing Dt:
|
07/02/2007
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Publication #:
|
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Pub Dt:
|
01/17/2008
| | | | |
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Title:
|
MULTI-STATION DECOUPLED REACTIVE ION ETCH CHAMBER
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|
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Patent #:
|
|
Issue Dt:
|
12/25/2012
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Application #:
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11961718
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Filing Dt:
|
12/20/2007
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Publication #:
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Pub Dt:
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06/04/2009
| | | | |
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Title:
|
MULTI-STATION PLASMA REACTOR WITH MULTIPLE PLASMA REGIONS
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|
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Patent #:
|
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Issue Dt:
|
10/30/2012
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Application #:
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12498295
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Filing Dt:
|
07/06/2009
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Publication #:
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Pub Dt:
|
05/27/2010
| | | | |
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Title:
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CAPACITIVE CVD REACTOR AND METHODS FOR PLASMA CVD PROCESS
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|
|
|
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Patent #:
|
|
Issue Dt:
|
02/07/2012
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Application #:
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12505381
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Filing Dt:
|
07/17/2009
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|
Publication #:
|
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Pub Dt:
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10/28/2010
| | | | |
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Title:
|
SYSTEM AND METHOD OF SENSING AND REMOVING RESIDUAL CHARGE FROM A PROCESSED WAFER
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|
|
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Patent #:
|
|
Issue Dt:
|
04/09/2013
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Application #:
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13082340
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Filing Dt:
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04/07/2011
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Publication #:
|
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Pub Dt:
|
07/28/2011
| | | | |
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Title:
|
PLASMA PROCESSING APPARATUS
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|
|
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Patent #:
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NONE
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Issue Dt:
|
|
Application #:
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13239316
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Filing Dt:
|
09/21/2011
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Publication #:
|
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Pub Dt:
|
03/29/2012
| | | | |
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Title:
|
SINGLE MATCHING NETWORK FOR MATCHING MULTI-FREQUENCY AND METHOD OF CONSTRUCTURING THE SAME AND RADIO FREQUENCY POWER SOURCE SYSTEM USING THE SAME
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|
|
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Patent #:
|
|
Issue Dt:
|
08/04/2015
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Application #:
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13337246
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Filing Dt:
|
12/26/2011
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Publication #:
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Pub Dt:
|
05/16/2013
| | | | |
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Title:
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METHOD AND SYSTEM FOR AUTOTUNING OF RF MATCH
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|
|
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Patent #:
|
|
Issue Dt:
|
07/28/2015
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Application #:
|
13337248
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Filing Dt:
|
12/26/2011
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|
Publication #:
|
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Pub Dt:
|
04/25/2013
| | | | |
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Title:
|
ICP SOURCE DESIGN FOR PLASMA UNIFORMITY AND EFFICIENCY ENHANCEMENT
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|
|
|
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Patent #:
|
NONE
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Issue Dt:
|
|
Application #:
|
13663408
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Filing Dt:
|
10/29/2012
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|
Publication #:
|
|
Pub Dt:
|
02/28/2013
| | | | |
|
Title:
|
CAPACITIVE CVD REACTOR AND METHODS FOR PLASMA CVD PROCESS
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|
|
|
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Patent #:
|
|
Issue Dt:
|
01/22/2019
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Application #:
|
14108241
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Filing Dt:
|
12/16/2013
|
|
Publication #:
|
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Pub Dt:
|
04/17/2014
| | | | |
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Title:
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PLASMA CONFINEMENT APPARATUS, AND METHOD FOR CONFINING A PLASMA
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