Patent Assignment Details
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| Reel/Frame: | 037804/0312 | |
| Pages: | 8 |
| | Recorded: | 02/23/2016 | | |
| Attorney Dkt #: | 0198-HC34US1 |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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14913863
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Filing Dt:
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02/23/2016
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Publication #:
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Pub Dt:
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12/08/2016
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Title:
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COMPOSITION FOR FORMING N-TYPE DIFFUSION LAYER, METHOD FOR FORMING N-TYPE DIFFUSION LAYER, METHOD OF PRODUCING SEMICONDUCTOR SUBSTRATE WITH N-TYPE DIFFUSION LAYER, AND METHOD FOR PRODUCING PHOTOVOLTAIC CELL ELEMENT
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Assignee
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| 9-2, MARUNOUCHI 1-CHOME |
| CHIYODA-KU |
| TOKYO, JAPAN 100-6606 |
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Correspondence name and address
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FANELLI HAAG PLLC
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1300 I STREET, N.W.
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SUITE 850 WEST
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WASHINGTON, DC 20005
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