Patent Assignment Details
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| Reel/Frame: | 037988/0334 | |
| Pages: | 3 |
| | Recorded: | 03/15/2016 | | |
| Attorney Dkt #: | 02887.0959 |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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04/02/2019
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Application #:
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15066667
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Filing Dt:
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03/10/2016
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Publication #:
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Pub Dt:
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02/09/2017
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Title:
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METHOD FOR PROCESSING SUBSTRATE INCLUDING FORMING A FILM ON A SILICON-CONTAINING SURFACE OF THE SUBSTRATE TO PREVENT RESIST FROM EXTRUDING FROM THE SUBSTRATE DURING AN IMPRINTING PROCESS
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Assignee
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| 1-1, SHIBAURA 1-CHOME, MINATO-KU |
| TOKYO, JAPAN |
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Correspondence name and address
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FINNEGAN
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901 NEW YORK AVENUE, NW
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WASHINGTON, DC, DC 20001
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