Patent Assignment Details
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| Reel/Frame: | 043470/0182 | |
| Pages: | 3 |
| | Recorded: | 09/01/2017 | | |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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11/02/2004
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Application #:
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09858400
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Filing Dt:
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05/16/2001
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Publication #:
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Pub Dt:
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11/06/2003
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Title:
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PROCESS FOR FORMING A LOW RESISTIVITY TITANIUM SILICIDE LAYER ON A SILICON SEMICONDUCTOR SUBSTRATE AND THE RESULTING DEVICE
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Assignees
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| GROENEWOUDSEWEG 1 |
| EINDHOVEN, NETHERLANDS 5621 BA |
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| 7, AVENUE GALLIENI |
| GENTILLY, FRANCE F-94250 |
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Correspondence name and address
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DAVID L. SCHAEFFER
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411 EAST PLUMERIA DRIVE, MS41
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NXP SEMICONDUCTORS, IP&L
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SAN JOSE, CA 95134
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