Patent Assignment Details
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| Reel/Frame: | 044624/0424 | |
| Pages: | 3 |
| | Recorded: | 01/16/2018 | | |
| Attorney Dkt #: | 62960-US-033-PCT(CA) |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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02/23/2021
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Application #:
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15856064
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Filing Dt:
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12/28/2017
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Publication #:
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Pub Dt:
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05/03/2018
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Title:
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ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK INCLUDING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
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Assignee
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| 26-30, NISHIAZABU 2-CHOME, MINATO-KU, |
| TOKYO, JAPAN 106-8620 |
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Correspondence name and address
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JCIPRNET
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P.O. BOX 600 TAIPEI GUTING
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TAIPEI CITY, 10099 TAIWAN
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