Patent Assignment Details
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Reel/Frame: | 046572/0506 | |
| Pages: | 7 |
| | Recorded: | 08/07/2018 | | |
Attorney Dkt #: | P201706391US01 |
Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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16056811
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Filing Dt:
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08/07/2018
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Publication #:
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Pub Dt:
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02/13/2020
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Title:
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A METHOD OF FABRICATION A SEMICONDUCTOR DEVICE INCLUDING DEPOSING A HIGH DENSITY PLASMA SiO2 LAYER WHERE HYDROGEN GAS IS NOT INTRODUCED INTO THE CHAMBER BEFORE THE SILANE SOURCE GAS
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Assignee
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NEW ORCHARD ROAD |
ARMONK, NEW YORK 10504 |
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Correspondence name and address
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CANTOR COLBURN LLP-IBM YORKTOWN
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20 CHURCH STREET
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22ND FLOOR
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HARTFORD, CT 06103
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