Patent Assignment Details
NOTE:Results display only for issued patents and published applications.
For pending or abandoned applications please consult USPTO staff.
|
| Reel/Frame: | 047624/0285 | |
| Pages: | 6 |
| | Recorded: | 11/29/2018 | | |
| Attorney Dkt #: | D18EL-039 |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
|
|
Total properties:
1
|
|
|
|
Patent #:
|
|
Issue Dt:
|
03/02/2021
|
Application #:
|
29671716
|
Filing Dt:
|
11/29/2018
|
|
Title:
|
GAS INTRODUCTION PLATE FOR PLASMA ETCHING APPARATUS FOR ETCHING SEMICONDUCTOR WAFER
|
|
|
Assignee
|
|
|
|
|
| 3-1, AKASAKA 5-CHOME, MINATO-KU, |
| TOKYO, JAPAN 107-6325 |
|
|
Correspondence name and address
|
| |
IPUSA, P.L.L.C
|
| |
1054 31ST STREET, N.W.
|
| |
SUITE 400
|
| |
WASHINGTON, DC 20007
|
Search Results as of:
05/07/2024 10:41 AM
If you have any comments or questions concerning the data displayed,
contact
PRD / Assignments at 571-272-3350. v.2.6
Web interface last modified:
August 25, 2017 v.2.6
|
