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Total properties:
25
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|
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Patent #:
|
|
Issue Dt:
|
07/05/2016
|
Application #:
|
13440862
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Filing Dt:
|
04/05/2012
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|
Publication #:
|
|
Pub Dt:
|
10/11/2012
| | | | |
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Title:
|
CLEANING APPARATUS AND METHOD, AND FILM GROWTH REACTION APPARATUS AND METHOD
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|
|
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Patent #:
|
|
Issue Dt:
|
01/05/2016
|
Application #:
|
13564427
|
Filing Dt:
|
08/01/2012
|
|
Publication #:
|
|
Pub Dt:
|
02/07/2013
| | | | |
|
Title:
|
CAPACITIVE-COUPLED PLASMA PROCESSING APPARATUS AND METHOD FOR PROCESSING SUBSTRATE
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
12/08/2015
|
Application #:
|
13620654
|
Filing Dt:
|
09/14/2012
|
|
Publication #:
|
|
Pub Dt:
|
01/10/2013
| | | | |
|
Title:
|
MULTI-STATION DECOUPLED REACTIVE ION ETCH CHAMBER
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|
|
|
|
Patent #:
|
NONE
|
Issue Dt:
|
|
Application #:
|
13681768
|
Filing Dt:
|
11/20/2012
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|
Publication #:
|
|
Pub Dt:
|
05/23/2013
| | | | |
|
Title:
|
CHEMICAL VAPOR DEPOSITION OR EPITAXIAL-LAYER GROWTH REACTOR AND SUPPORTER THEREOF
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|
|
|
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Patent #:
|
|
Issue Dt:
|
09/13/2016
|
Application #:
|
13888330
|
Filing Dt:
|
05/06/2013
|
|
Publication #:
|
|
Pub Dt:
|
11/07/2013
| | | | |
|
Title:
|
METHOD AND DEVICE FOR MEASURING TEMPERATURE OF SUBSTRATE IN VACUUM PROCESSING APPARATUS
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
01/03/2017
|
Application #:
|
13891138
|
Filing Dt:
|
05/09/2013
|
|
Publication #:
|
|
Pub Dt:
|
11/14/2013
| | | | |
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Title:
|
GAS SHOWERHEAD, METHOD FOR MAKING THE SAME AND THIN FILM GROWTH REACTOR
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
03/01/2016
|
Application #:
|
14052650
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Filing Dt:
|
10/11/2013
|
|
Publication #:
|
|
Pub Dt:
|
04/17/2014
| | | | |
|
Title:
|
PLASMA PROCESSING METHOD AND PLASMA PROCESSING DEVICE
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
04/25/2017
|
Application #:
|
14065260
|
Filing Dt:
|
10/28/2013
|
|
Publication #:
|
|
Pub Dt:
|
05/01/2014
| | | | |
|
Title:
|
PERFORMANCE ENHANCEMENT OF COATING PACKAGED ESC FOR SEMICONDUCTOR APPARATUS
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|
|
|
|
Patent #:
|
NONE
|
Issue Dt:
|
|
Application #:
|
14065323
|
Filing Dt:
|
10/28/2013
|
|
Publication #:
|
|
Pub Dt:
|
05/01/2014
| | | | |
|
Title:
|
COATING FOR PERFORMANCE ENHANCEMENT OF SEMICONDUCTOR APPARATUS
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
04/11/2017
|
Application #:
|
14066584
|
Filing Dt:
|
10/29/2013
|
|
Publication #:
|
|
Pub Dt:
|
05/01/2014
| | | | |
|
Title:
|
COATING PACKAGED CHAMBER PARTS FOR SEMICONDUCTOR PLASMA APPARATUS
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
08/30/2016
|
Application #:
|
14066631
|
Filing Dt:
|
10/29/2013
|
|
Publication #:
|
|
Pub Dt:
|
05/01/2014
| | | | |
|
Title:
|
ICP SOURCE DESIGN FOR PLASMA UNIFORMITY AND EFFICIENCY ENHANCEMENT
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
07/04/2017
|
Application #:
|
14333477
|
Filing Dt:
|
07/16/2014
|
|
Publication #:
|
|
Pub Dt:
|
01/22/2015
| | | | |
|
Title:
|
METHOD FOR MEASURING TEMPERATURE OF FILM IN REACTION CHAMBER
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
12/26/2017
|
Application #:
|
14386765
|
Filing Dt:
|
09/19/2014
|
|
Publication #:
|
|
Pub Dt:
|
01/22/2015
| | | | |
|
Title:
|
APPARATUS AND METHOD FOR CONTROLLING HEATING OF BASE WITHIN CHEMICAL VAPOUR DEPOSITION CHAMBER
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
02/05/2019
|
Application #:
|
14745273
|
Filing Dt:
|
06/19/2015
|
|
Publication #:
|
|
Pub Dt:
|
10/08/2015
| | | | |
|
Title:
|
HIGH FREQUENCY POWER SUPPLY DEVICE AND HIGH FREQUENCY POWER SUPPLYING METHOD
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
01/07/2020
|
Application #:
|
14946188
|
Filing Dt:
|
11/19/2015
|
|
Publication #:
|
|
Pub Dt:
|
06/16/2016
| | | | |
|
Title:
|
DEVICE OF CHANGING GAS FLOW PATTERN AND A WAFER PROCESSING METHOD AND APPARATUS
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
06/16/2020
|
Application #:
|
14952230
|
Filing Dt:
|
11/25/2015
|
|
Publication #:
|
|
Pub Dt:
|
12/01/2016
| | | | |
|
Title:
|
PROCESSING CHAMBER, COMBINATION OF PROCESSING CHAMBER AND LOADLOCK, AND SYSTEM FOR PROCESSING SUBSTRATES
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
03/26/2019
|
Application #:
|
15139156
|
Filing Dt:
|
04/26/2016
|
|
Publication #:
|
|
Pub Dt:
|
11/03/2016
| | | | |
|
Title:
|
CHEMICAL VAPOR DEPOSITION APPARATUS AND ITS CLEANING METHOD
|
|
|
|
|
Patent #:
|
NONE
|
Issue Dt:
|
|
Application #:
|
15207495
|
Filing Dt:
|
07/11/2016
|
|
Publication #:
|
|
Pub Dt:
|
11/03/2016
| | | | |
|
Title:
|
ICP SOURCE DESIGN FOR PLASMA UNIFORMITY AND EFFICIENCY ENHANCEMENT
|
|
|
|
|
Patent #:
|
NONE
|
Issue Dt:
|
|
Application #:
|
15380979
|
Filing Dt:
|
12/15/2016
|
|
Publication #:
|
|
Pub Dt:
|
06/29/2017
| | | | |
|
Title:
|
MULTI-ZONE ACTIVE-MATRIX TEMPERATURE CONTROL SYSTEM AND TEMPERATURE CONTROL METHOD, AND ELECTROSTATIC CHUCK AND PLASMA PROCESSING APPARATUS APPLY THEREOF
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
03/17/2020
|
Application #:
|
15385806
|
Filing Dt:
|
12/20/2016
|
|
Publication #:
|
|
Pub Dt:
|
06/29/2017
| | | | |
|
Title:
|
TEMPERATURE ADJUSTING APPARATUS AND METHOD FOR A FOCUS RING
|
|
|
|
|
Patent #:
|
NONE
|
Issue Dt:
|
|
Application #:
|
15387644
|
Filing Dt:
|
12/21/2016
|
|
Publication #:
|
|
Pub Dt:
|
06/29/2017
| | | | |
|
Title:
|
ELECTRODE STRUCTURE FOR ICP ETCHER
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
04/24/2018
|
Application #:
|
15445714
|
Filing Dt:
|
02/28/2017
|
|
Publication #:
|
|
Pub Dt:
|
08/24/2017
| | | | |
|
Title:
|
COATING PACKAGED CHAMBER PARTS FOR SEMICONDUCTOR PLASMA APPARATUS
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
05/07/2019
|
Application #:
|
15851187
|
Filing Dt:
|
12/21/2017
|
|
Publication #:
|
|
Pub Dt:
|
04/26/2018
| | | | |
|
Title:
|
APPARATUS AND METHOD FOR CONTROLLING HEATING OF BASE WITHIN CHEMICAL VAPOUR DEPOSITION CHAMBER
|
|
|
|
|
Patent #:
|
NONE
|
Issue Dt:
|
|
Application #:
|
16025995
|
Filing Dt:
|
07/02/2018
|
|
Publication #:
|
|
Pub Dt:
|
01/03/2019
| | | | |
|
Title:
|
PLASMA REACTOR HAVING A VARIABLE COUPLING OF LOW FREQUENCY RF POWER TO AN ANNULAR ELECTRODE
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
11/03/2020
|
Application #:
|
16134801
|
Filing Dt:
|
09/18/2018
|
|
Publication #:
|
|
Pub Dt:
|
01/31/2019
| | | | |
|
Title:
|
METHOD TO IMPROVE MOCVD REACTION PROCESS BY FORMING PROTECTIVE FILM
|
|
