Patent Assignment Details
NOTE:Results display only for issued patents and published applications.
For pending or abandoned applications please consult USPTO staff.
|
Reel/Frame: | 050638/0901 | |
| Pages: | 5 |
| | Recorded: | 10/07/2019 | | |
Conveyance: | CHANGE OF NAME (SEE DOCUMENT FOR DETAILS). |
|
Total properties:
1
|
|
Patent #:
|
|
Issue Dt:
|
11/16/2010
|
Application #:
|
12198912
|
Filing Dt:
|
08/27/2008
|
Publication #:
|
|
Pub Dt:
|
12/25/2008
| | | | |
Title:
|
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND SUBSTRATE WITH FUNCTIONAL FILM FOR THE SAME
|
|
Assignee
|
|
|
5-1, MARUNOUCHI 1-CHOME, CHIYODA-KU, |
TOKYO, JAPAN 100-8405 |
|
Correspondence name and address
|
|
CPA
|
|
LIBERATION HOUSE
|
|
CASTLE STREET
|
|
ST HELIER, JEI IBL JERSEY
|
Search Results as of:
05/10/2024 07:10 AM
If you have any comments or questions concerning the data displayed,
contact
PRD / Assignments at 571-272-3350. v.2.6
Web interface last modified:
August 25, 2017 v.2.6
|