Patent Assignment Details
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| Reel/Frame: | 050807/0181 | |
| Pages: | 3 |
| | Recorded: | 10/23/2019 | | |
| Attorney Dkt #: | 18506-1593 |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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11/02/2021
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Application #:
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16548819
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Filing Dt:
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08/22/2019
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Publication #:
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Pub Dt:
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02/25/2021
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Title:
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APPARATUS FOR FORMING A PHOTORESIST LAYER, METHOD FOR FORMING A MASKING LAYER, AND METHOD FOR FORMING A PHOTORESIST LAYER
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Assignee
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| NO.8, LI-HSIN RD. 6, HSINCHU SCIENCE PARK |
| HSINCHU, TAIWAN |
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Correspondence name and address
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WPAT, PC INTELLECTUAL PROPERTY ATTORNEYS
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1100 QUAIL STREET, SUITE 202
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NEWPORT BEACH, CA 92660
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05/22/2024 01:49 PM
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