Patent Assignment Details
NOTE:Results display only for issued patents and published applications.
For pending or abandoned applications please consult USPTO staff.
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| Reel/Frame: | 051383/0740 | |
| Pages: | 3 |
| | Recorded: | 12/30/2019 | | |
| Attorney Dkt #: | TSM13-1170 |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
3
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Patent #:
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Issue Dt:
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09/29/2015
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Application #:
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14056649
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Filing Dt:
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10/17/2013
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Publication #:
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Pub Dt:
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04/23/2015
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Title:
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Fin Spacer Protected Source and Drain Regions in FinFETs
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Patent #:
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Issue Dt:
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04/03/2018
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Application #:
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14851535
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Filing Dt:
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09/11/2015
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Publication #:
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Pub Dt:
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01/07/2016
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Title:
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Fin Spacer Protected Source and Drain Regions in FinFETs
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Patent #:
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Issue Dt:
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06/09/2020
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Application #:
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15911488
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Filing Dt:
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03/05/2018
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Publication #:
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Pub Dt:
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07/12/2018
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Title:
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Fin Spacer Protected Source and Drain Regions in FinFETs
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Assignee
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| 8, LI-HSIN RD. 6 |
| HSINCHU SCIENCE PARK |
| HSINCHU, TAIWAN 300-78 |
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Correspondence name and address
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SLATER MATSIL LLP/TSMC
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17950 PRESTON ROAD, SUITE 1000
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DALLAS, TX 75252
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