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Reel/Frame:051952/0089   Pages: 4
Recorded: 02/27/2020
Attorney Dkt #:09408ZP USA
Conveyance: ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Total properties: 1
1
Patent #:
Issue Dt:
03/21/2023
Application #:
16737417
Filing Dt:
01/08/2020
Publication #:
Pub Dt:
07/30/2020
Title:
Shallow Trench Isolation (STI) Chemical Mechanical Planarization (CMP) Polishing With Tunable Silicon Oxide And Silicon Nitride Removal Rates
Assignors
1
Exec Dt:
02/25/2002
2
Exec Dt:
02/25/2020
3
Exec Dt:
02/25/2020
4
Exec Dt:
02/25/2020
5
Exec Dt:
02/25/2020
Assignee
1
8555 SOUTH RIVER PARKWAY
PATENT DEPT.
TEMPE, ARIZONA 85284
Correspondence name and address
LISA HOFFMANN
7350 TILGHMAN STREET, SUITE 104
PATENT DEPT.
ALLENTOWN, PA 18106-9000

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