|
Total properties:
18
|
|
|
|
Patent #:
|
|
Issue Dt:
|
05/22/2007
|
Application #:
|
10988042
|
Filing Dt:
|
11/12/2004
|
|
Publication #:
|
|
Pub Dt:
|
06/16/2005
| | | | |
|
Title:
|
METHOD FOR ETCHING OF A SILICON SUBSTRATE AND ETCHING APPARATUS
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
07/13/2010
|
Application #:
|
11459646
|
Filing Dt:
|
07/25/2006
|
|
Publication #:
|
|
Pub Dt:
|
02/01/2007
| | | | |
|
Title:
|
ETCHING METHOD AND ETCHING APPARATUS
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
08/27/2013
|
Application #:
|
12089474
|
Filing Dt:
|
04/07/2008
|
|
Publication #:
|
|
Pub Dt:
|
11/12/2009
| | | | |
|
Title:
|
PLASMA ETCHING METHOD CAPABLE OF DETECTING END POINT AND PLASMA ETCHING DEVICE THEREFOR
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
10/07/2014
|
Application #:
|
12593526
|
Filing Dt:
|
09/28/2009
|
|
Publication #:
|
|
Pub Dt:
|
02/25/2010
| | | | |
|
Title:
|
PLASMA PROCESSOR
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
07/08/2014
|
Application #:
|
12922520
|
Filing Dt:
|
09/14/2010
|
|
Publication #:
|
|
Pub Dt:
|
01/13/2011
| | | | |
|
Title:
|
PLASMA PROCESSING APPARATUS
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
10/01/2013
|
Application #:
|
12997942
|
Filing Dt:
|
12/14/2010
|
|
Publication #:
|
|
Pub Dt:
|
04/28/2011
| | | | |
|
Title:
|
METHOD, APPARATUS AND PROGRAM FOR MANUFACTURING SILICON STRUCTURE
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
03/18/2014
|
Application #:
|
13318279
|
Filing Dt:
|
10/31/2011
|
|
Publication #:
|
|
Pub Dt:
|
03/01/2012
| | | | |
|
Title:
|
Plasma Etching Method
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
12/03/2013
|
Application #:
|
13517193
|
Filing Dt:
|
06/19/2012
|
|
Publication #:
|
|
Pub Dt:
|
10/11/2012
| | | | |
|
Title:
|
DEPOSITION METHOD
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
02/12/2019
|
Application #:
|
13578739
|
Filing Dt:
|
08/13/2012
|
|
Publication #:
|
|
Pub Dt:
|
12/06/2012
| | | | |
|
Title:
|
ETCHING DEVICE, PLASMA PROCESSING DEVICE
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
01/14/2014
|
Application #:
|
13638144
|
Filing Dt:
|
09/28/2012
|
|
Publication #:
|
|
Pub Dt:
|
02/07/2013
| | | | |
|
Title:
|
Plasma Etching Method
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
10/14/2014
|
Application #:
|
13809624
|
Filing Dt:
|
01/11/2013
|
|
Publication #:
|
|
Pub Dt:
|
05/09/2013
| | | | |
|
Title:
|
Etching Method
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
09/01/2015
|
Application #:
|
14237147
|
Filing Dt:
|
02/04/2014
|
|
Publication #:
|
|
Pub Dt:
|
07/03/2014
| | | | |
|
Title:
|
Plasma Etching Method
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
08/25/2015
|
Application #:
|
14238289
|
Filing Dt:
|
02/11/2014
|
|
Publication #:
|
|
Pub Dt:
|
08/07/2014
| | | | |
|
Title:
|
APPARATUS, METHOD AND PROGRAM FOR MANUFACTURING NITRIDE FILM
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
05/07/2019
|
Application #:
|
15035744
|
Filing Dt:
|
05/10/2016
|
|
Publication #:
|
|
Pub Dt:
|
09/01/2016
| | | | |
|
Title:
|
SILICON NITRIDE FILM AND METHOD OF MAKING THEREOF
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
12/07/2021
|
Application #:
|
15760298
|
Filing Dt:
|
03/15/2018
|
|
Publication #:
|
|
Pub Dt:
|
11/01/2018
| | | | |
|
Title:
|
PLASMA CONTROL APPARATUS
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
02/11/2020
|
Application #:
|
16082619
|
Filing Dt:
|
09/06/2018
|
|
Publication #:
|
|
Pub Dt:
|
03/21/2019
| | | | |
|
Title:
|
METHOD FOR PRODUCING SILICON NITRIDE FILM AND SILICON NITRIDE FILM
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
07/19/2022
|
Application #:
|
16613975
|
Filing Dt:
|
11/15/2019
|
|
Publication #:
|
|
Pub Dt:
|
08/26/2021
| | | | |
|
Title:
|
SUBSTRATE PLACING TABLE, PLASMA PROCESSING APPARATUS PROVIDED WITH SAME, AND PLASMA PROCESSING METHOD
|
|
|
|
|
Patent #:
|
NONE
|
Issue Dt:
|
|
Application #:
|
16629085
|
Filing Dt:
|
01/07/2020
|
|
Publication #:
|
|
Pub Dt:
|
04/23/2020
| | | | |
|
Title:
|
Wide-Gap Semiconductor Substrate, Apparatus For Manufacturing Wide-Gap Semiconductor Substrate, And Method For Manufacturing Wide-Gap Semiconductor Substrate
|
|
