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Reel/Frame:053786/0340   Pages: 5
Recorded: 09/16/2020
Attorney Dkt #:00158.0710.00US
Conveyance: ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Total properties: 1
1
Patent #:
Issue Dt:
02/21/2023
Application #:
17022364
Filing Dt:
09/16/2020
Publication #:
Pub Dt:
03/25/2021
Title:
Method of Manufacturing a Semiconductor Structure by Forming a Mask Layer using Sidewall Spacers as an Alignment Mark
Assignors
1
Exec Dt:
09/01/2020
2
Exec Dt:
09/01/2020
3
Exec Dt:
09/01/2020
4
Exec Dt:
09/01/2020
Assignees
1
18 ZHANGJIANG ROAD, PUDONG NEW AREA
SHANGHAI, CHINA 201203
2
NO.18, WEN CHANG RD., ECONOMIC-TECHNOLOGICAL,DEVELOPMENT AREA, DAXING DISTRICT
BEIJING, CHINA 100716
Correspondence name and address
ANOVA LAW GROUP C/O SMIC
21495 RIDGETOP CIRCLE
SUITE 300
STERLING, VA 20166

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