Patent Assignment Details
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| Reel/Frame: | 054644/0001 | |
| Pages: | 3 |
| | Recorded: | 12/15/2020 | | |
| Attorney Dkt #: | 089264-US-033-PCT(CA) |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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17120269
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Filing Dt:
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12/14/2020
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Publication #:
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Pub Dt:
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04/08/2021
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Title:
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ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND PHOTO MASK
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Assignee
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| 26-30, NISHIAZABU 2-CHOME, MINATO-KU, |
| TOKYO, JAPAN 106-8620 |
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Correspondence name and address
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JCIPRNET
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8F-1, NO. 100, ROOSEVELT RD. SEC. 2,
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TAIPEI, 100404 TAIWAN
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