Patent Assignment Details
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For pending or abandoned applications please consult USPTO staff.
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| Reel/Frame: | 059077/0816 | |
| Pages: | 8 |
| | Recorded: | 02/23/2022 | | |
| Attorney Dkt #: | Q267157 |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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17678271
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Filing Dt:
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02/23/2022
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Publication #:
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Pub Dt:
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06/09/2022
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Title:
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ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMATION METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, COMPOUND, AND RESIN
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Assignee
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| 26-30, NISHIAZABU 2-CHOME, MINATO-KU |
| TOKYO, JAPAN 106-8620 |
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Correspondence name and address
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SUGHRUE MION, PLLC
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2000 PENNSYLVANIA AVENUE NW
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SUITE 9000
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WASHINGTON, DC 20006-1811
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