Patent Assignment Details
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| Reel/Frame: | 059799/0376 | |
| Pages: | 7 |
| | Recorded: | 05/03/2022 | | |
| Attorney Dkt #: | 220403 |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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17735647
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Filing Dt:
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05/03/2022
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Publication #:
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Pub Dt:
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12/22/2022
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Title:
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CHEMICALLY AMPLIFIED RESIST COMPOSITION, PHOTOMASK BLANK, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING POLYMER COMPOUND
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Assignee
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| 4-1, MARUNOUCHI 1-CHOME, CHIYODA-KU |
| TOKYO, JAPAN 100-0005 |
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Correspondence name and address
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AARON L. WEBB
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OLIFF PLC
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P.O. BOX 320850
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ALEXANDRIA, VA 22320-4850
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