Patent Assignment Details
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| Reel/Frame: | 064068/0218 | |
| Pages: | 3 |
| | Recorded: | 06/27/2023 | | |
| Attorney Dkt #: | TSMC/P20204061US01 |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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18214558
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Filing Dt:
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06/27/2023
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Publication #:
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Pub Dt:
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12/07/2023
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Title:
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METHOD FOR FORMING EPITAXIAL SOURCE/DRAIN FEATURES USING A SELF-ALIGNED MASK AND SEMICONDUCTOR DEVICES FABRICATED THEREOF
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Assignee
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| 8, LI-HSIN RD. 6, HSINCHU SCIENCE PARK |
| HSINCHU, TAIWAN 300-78 |
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Correspondence name and address
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NZ CARR LAW OFFICE
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2101 CITYWEST BLVD. STE 100
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HOUSTON, TX 77042
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05/15/2024 06:42 AM
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