Patent Assignment Details
NOTE:Results display only for issued patents and published applications.
For pending or abandoned applications please consult USPTO staff.
|
| Reel/Frame: | 065944/0340 | |
| Pages: | 9 |
| | Recorded: | 12/22/2023 | | |
| Attorney Dkt #: | 20277-158073-US |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
|
|
Total properties:
1
|
|
|
|
Patent #:
|
NONE
|
Issue Dt:
|
|
Application #:
|
18273014
|
Filing Dt:
|
07/18/2023
|
|
Publication #:
|
|
Pub Dt:
|
04/11/2024
| | | | |
|
Title:
|
POLYMER, COMPOSITION, METHOD FOR PRODUCING POLYMER, COMPOSITION FOR FILM FORMATION, RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, RADIATION-SENSITIVE COMPOSITION, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, METHOD FOR PRODUCING UNDERLAYER FILM FOR LITHOGRAPHY, CIRCUIT PATTERN FORMATION METHOD, AND COMPOSITION FOR OPTICAL MEMBER FORMATION
|
|
|
Assignee
|
|
|
|
|
| 5-2, MARUNOUCHI 2-CHOME |
| CHIYODA-KU |
| TOKYO, JAPAN 100-8324 |
|
|
Correspondence name and address
|
| |
FITCH, EVEN, TABIN & FLANNERY LLP
|
| |
120 SOUTH LASALLE STREET
|
| |
SUITE 2100
|
| |
CHICAGO, IL 60603
|
Search Results as of:
05/14/2024 10:24 PM
If you have any comments or questions concerning the data displayed,
contact
PRD / Assignments at 571-272-3350. v.2.6
Web interface last modified:
August 25, 2017 v.2.6
|
