Patent Assignment Details
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| Reel/Frame: | 015110/0082 | |
| Pages: | 4 |
| | Recorded: | 09/07/2004 | | |
| Conveyance: | RECORD TO CORRECT THE SECOND INVENTOR'S NAME ON AN ASSIGNMENT PREVIOUSLY RECORDED ON REEL 014768 FRAME 0577 |
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Total properties:
1
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Patent #:
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Issue Dt:
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10/07/2008
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Application #:
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10728135
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Filing Dt:
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12/03/2003
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Publication #:
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Pub Dt:
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06/09/2005
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Title:
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IMMERSION LITHOGRAPHY PROCESS AND MASK LAYER STRUCTURE APPLIED IN THE SAME
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Assignee
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| NO. 3. LI-HSIN R. II, SCIENCE-BASED |
| INDUSTRIAL PARK, |
| HSINCHU, TAIWAN R.O.C. |
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Correspondence name and address
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J. C. PATENTS
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4 VENTURE, SUITE 250
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IRVINE, CA 92618
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